WO2006070107A1 - Dispositif de sterilisation par plasma gazeux - Google Patents
Dispositif de sterilisation par plasma gazeux Download PDFInfo
- Publication number
- WO2006070107A1 WO2006070107A1 PCT/FR2005/003223 FR2005003223W WO2006070107A1 WO 2006070107 A1 WO2006070107 A1 WO 2006070107A1 FR 2005003223 W FR2005003223 W FR 2005003223W WO 2006070107 A1 WO2006070107 A1 WO 2006070107A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- magnetron
- power
- diode
- delivered
- supply circuit
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
- A61L2/00—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor
- A61L2/02—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor using physical phenomena
- A61L2/14—Plasma, i.e. ionised gases
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/64—Heating using microwaves
- H05B6/66—Circuits
- H05B6/68—Circuits for monitoring or control
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2242/00—Auxiliary systems
- H05H2242/20—Power circuits
- H05H2242/24—Radiofrequency or microwave generators
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2245/00—Applications of plasma devices
- H05H2245/30—Medical applications
- H05H2245/36—Sterilisation of objects, liquids, volumes or surfaces
Definitions
- the present invention relates to a sterilization device in particular for medical instruments of the type using a gaseous plasma.
- a gas which does not itself have bactericidal properties, is used, which is subjected to an electric field sufficiently high to cause its ionization and dissociation. of its molecules.
- the gas produced downstream of the plasma referred to as "post-discharge gas" has sterilizing properties. This gas is admitted into a treatment chamber where it exerts its bactericidal action on the instruments to be sterilized.
- the technique of high frequency currents has the disadvantage of using electrodes which wear out and which do not make it possible to obtain good stability of the device so that the latter must be permanently readjusted.
- the microwave technique does not have these drawbacks, but it is nevertheless not exempt from certain constraints, particularly with regard to the lifetime and the frequency stability of the magnetron generating the microwaves.
- a microwave source consists of a magnetron that delivers its energy in a waveguide that transmits it to a resonant cavity - O - '
- the power absorbed in the resonant cavity is essentially variable since it depends on the mass of instruments to be sterilized. Therefore it is important that the magnetron can operate with a reflected power corresponding to its total power (which corresponds to a resonant cavity almost empty) and this a significant number of times without suffering irreversible damage.
- the object of the present invention is to propose a microwave generator intended for the production of a gaseous plasma which overcomes these disadvantages by ensuring excellent operating stability and optimum life of its magnetron.
- the present invention thus relates to a device for producing a gaseous plasma by ionization of a gas by means of a microwave source of determined nominal power, comprising a magnetron, receiving its electrical energy from a circuit of power supply, characterized in that the power delivered by the magnetron power supply circuit is at most equal to a quarter of the nominal power of the magnetron. Preferably, this power will be between one tenth and one quarter of the nominal power of the magnetron.
- the power delivered by the magnetron power supply circuit will be at most equal to a quarter of the product of the nominal power of the magnetron by the reflection coefficient of the magnetron.
- the device according to the invention may comprise means adapted to limit the power delivered to the magnetron, which are such that the temperature thereof does not exceed 80 0 C.
- the present invention is particularly interesting in terms of production costs in that it makes it possible to use circuits existing on the market in the household sector and which, because of their manufacture in very large series, are of cost price particularly competitive.
- a disadvantage of such circuits when it is desired to use them in certain areas such as the medical field of sterilization is that, on the one hand, they have a significant power of the order of 800 W while in the sterilization field the absorbable power by the treatment cavity is of the order of only 100W and that, on the other hand, they are of low reliability.
- the excess power it is of course understood that it is not conceivable to use such a circuit such as the reflected power which would then be of the order of 700 W would have the immediate effect of causing a heating of the magnetron causing its destruction.
- the power supply of the magnetron will be limited, which will have the effect of limiting the energy reflected towards it, and this limitation will occur without reducing the peak voltage necessary for the ignition.
- a particularly advantageous way of reducing the electrical power supplied to the magnetron while maintaining said peak voltage at a sufficient value is to use a voltage doubler implementing a diode and a capacitor arranged in series across the secondary winding and use a capacitor of a value low enough to drop the voltage. It has been found that under these conditions the power supplied by the magnetron is sufficiently diminished to ensure sufficient reliability while preserving its starting peak voltage.
- ROS Report of Standing Waves
- ROS 1 + r / l-r r being the reflection coefficient which is equal to the ratio of the power reflected on the transmitted power.
- the energy that can be dissipated thermally by a magnetron is proportional to its power.
- the corresponding reflection coefficient r is 0.6, so that a magnetron with a nominal power of 800 watts will have an admissible reflected power of 480. watts, whereas this same value for a magnetron with a nominal power of 300 watts would be only 180 watts.
- the power required for a specific operation is 100 watts and if it is desired that the device is able to dissipate without problem 100% of the power received (which corresponds substantially to the case of an empty resonant speaker) it will be sufficient for the power P d delivered to the magnetron to be at most equal to:
- Pd P n • where P n is the minimum power of the magnetron. Note that in the case of use of a magnetron household type, the latter having a nominal power of about 800 watts will have a power of 480 watts admissible reflected, so that it will be perfectly able to to reliably ensure the production of a plasma for sterilization purposes requiring a power of 100 W. It was thus found that under these conditions the rise in temperature of the magnetron was very low which then gave an excellent frequency stability allowing the production thereof a plasma when the power delivered to the magnetron was between the tenth and the first. quarter of its nominal power.
- FIG. 1 is a schematic view of a device according to the invention.
- FIG. 2 is a curve showing the variation of the power delivered to the magnetron as a function of the value of the capacity of the capacitor of the supply means.
- FIG. 3 is a curve representing the variation of the voltage as a function of time at the terminals of the magnetron in a device of the type shown in FIG.
- Figure 4 is a schematic view of an alternative embodiment of the invention.
- FIG. 1 shows a supply device capable of supplying a magnetron with the energy it needs to produce a gaseous plasma.
- This gaseous plasma is particularly intended, via its post-discharge gas, to provide a sterilization function.
- the power supply consists essentially of a voltage-booster power supply transformer, in a ratio of approximately 10, so that for a peak-peak supply voltage of 220 V, it is provided at the secondary Ib thereof. with a peak-to-peak voltage of approximately 2200 V.
- a capacitor C and a diode D are arranged in series between the terminals A and B of which is connected a magnetron 7. This magnetron is joined by a waveguide 8 to a resonant cavity 9.
- the diode D and the capacitor C constitute a doubler of voltage making it possible to multiply the output voltage of the transformer 1 by 2 since during the positive half-cycle the capacitor C charges and when the alternation becomes negative the capacitor voltage is added to the voltage value of it.
- a curve of the power variation P supplied by the magnetron power supply circuit 7 is established as a function of the value of the capacitor C. It can thus be seen in FIG. 2 that the power P decreases with the value of the capacitor.
- the delivered power is approximately 900 W, whereas if the value of the capacitor C is brought back to 0, 1 ⁇ F this power drops to 100 W which is a value which corresponds to that used in the particular field of the production of a gaseous plasma for sterilization by its post-discharge gas.
- This is particularly interesting since, even if the power is totally reflected, the value thereof will be below the value of the allowable return power which for a magnetron with a nominal power of 800 W is 480 W.
- FIG. 3 shows a curve expressing the variation of the voltage at terminals A and B of the magnetron power supply. It can be seen on this one that the voltage peak at the beginning of alternation is well maintained, which makes it possible to ensure correct priming of the magnetron.
- FIG. 4 It is also possible according to the invention, as shown in FIG. 4, to provide a double alternation power supply for the magnetron.
- a loop has been realized comprising two diodes in series, namely a first diode D1 and a second diode D2, the output of the first being connected to the input of the second and two capacitors C1 and C2.
- An output terminal E of the transformer 1 is connected between the two capacitors C1 and C2, and the other output terminal _F is connected via a resistor R to the input of the diode D2.
- the magnetron is supplied between the input terminal A 'of the first diode D1 and the output terminal B' of the second diode D2.
- Such an assembly accumulates the two voltage doublers, and the voltage delivered between the terminals A 'and B' is the sum of the voltages across the capacitors C1 and C2. Indeed during the positive half-wave the capacitor C1 is charged through the diode D1. When the alternation becomes negative the capacitor C2 is charged through the diode D2.
Abstract
Description
Claims
Priority Applications (11)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2005800444872A CN101147431B (zh) | 2004-12-23 | 2005-12-21 | 气体等离子体灭菌装置 |
BRPI0519220-0A BRPI0519220B1 (pt) | 2004-12-23 | 2005-12-21 | Gas plasma esterelization device |
DK05850568T DK1829438T3 (en) | 2004-12-23 | 2005-12-21 | A device for sterilization by using gas plasma |
CA2594004A CA2594004C (fr) | 2004-12-23 | 2005-12-21 | Dispositif de sterilisation par plasma gazeux |
US11/722,722 US7928339B2 (en) | 2004-12-23 | 2005-12-21 | Device for gaseous plasma sterilization |
AU2005321172A AU2005321172B2 (en) | 2004-12-23 | 2005-12-21 | Device for gaseous plasma sterilization |
JP2007547570A JP5107052B2 (ja) | 2004-12-23 | 2005-12-21 | ガス状プラズマ滅菌装置 |
ES05850568.6T ES2532261T3 (es) | 2004-12-23 | 2005-12-21 | Dispositivo de esterilización por plasma gaseoso |
EP05850568.6A EP1829438B1 (fr) | 2004-12-23 | 2005-12-21 | Dispositif de sterilisation par plasma gazeux |
IL183864A IL183864A (en) | 2004-12-23 | 2007-06-12 | Gaseous plasma disinfection device |
HK08107797.2A HK1117327A1 (en) | 2004-12-23 | 2008-07-15 | Device for gaseous plasma sterilization |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0413818 | 2004-12-23 | ||
FR0413818A FR2880235B1 (fr) | 2004-12-23 | 2004-12-23 | Dispositif de sterilisation par plasma gazeux |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2006070107A1 true WO2006070107A1 (fr) | 2006-07-06 |
WO2006070107A8 WO2006070107A8 (fr) | 2007-08-16 |
Family
ID=34952664
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/FR2005/003223 WO2006070107A1 (fr) | 2004-12-23 | 2005-12-21 | Dispositif de sterilisation par plasma gazeux |
Country Status (16)
Country | Link |
---|---|
US (1) | US7928339B2 (fr) |
EP (1) | EP1829438B1 (fr) |
JP (1) | JP5107052B2 (fr) |
KR (1) | KR20070107681A (fr) |
CN (1) | CN101147431B (fr) |
AU (1) | AU2005321172B2 (fr) |
BR (1) | BRPI0519220B1 (fr) |
CA (1) | CA2594004C (fr) |
DK (1) | DK1829438T3 (fr) |
ES (1) | ES2532261T3 (fr) |
FR (1) | FR2880235B1 (fr) |
HK (1) | HK1117327A1 (fr) |
IL (1) | IL183864A (fr) |
RU (1) | RU2388195C2 (fr) |
TW (1) | TWI389710B (fr) |
WO (1) | WO2006070107A1 (fr) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ES2814004T3 (es) | 2016-08-09 | 2021-03-25 | John Bean Technologies Corp | Aparato y procedimiento de procesamiento de radiofrecuencia |
CN113426020B (zh) * | 2021-05-25 | 2022-09-09 | 深圳市飞立电器科技有限公司 | 一种接触式等离子消毒仪 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4317976A (en) * | 1978-06-28 | 1982-03-02 | Tokyo Shibaura Denki Kabushiki Kaisha | High frequency heating apparatus |
US4849595A (en) * | 1985-06-17 | 1989-07-18 | Robertshaw Controls Company | Electrically operated control device and system for a microwave oven |
EP0424365A2 (fr) * | 1987-07-06 | 1991-04-24 | Matsushita Electric Industrial Co., Ltd. | Dispositif de commande pour appareil électrique |
JPH06104079A (ja) * | 1992-09-16 | 1994-04-15 | Sanyo Electric Co Ltd | 高周波加熱装置 |
US5325020A (en) * | 1990-09-28 | 1994-06-28 | Abtox, Inc. | Circular waveguide plasma microwave sterilizer apparatus |
US6445596B1 (en) * | 1999-06-15 | 2002-09-03 | Matsushita Electric Industrial Co., Ltd. | Magnetron drive power supply |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS491523Y1 (fr) * | 1969-05-22 | 1974-01-16 | ||
JPH0635662B2 (ja) * | 1985-09-19 | 1994-05-11 | 松下電器産業株式会社 | プラズマ装置 |
JPS62208378A (ja) * | 1986-02-28 | 1987-09-12 | 東洋製罐株式会社 | デユアル・オ−ブナブル容器 |
GB8613567D0 (en) * | 1986-06-04 | 1986-07-09 | Electrolux Ab | Power supply circuits |
JPH02279160A (ja) * | 1989-03-08 | 1990-11-15 | Abtox Inc | プラズマ滅菌方法及び滅菌装置 |
JPH0594899A (ja) * | 1991-10-02 | 1993-04-16 | Nippon Steel Corp | プラズマ処理装置 |
JPH05144381A (ja) * | 1991-11-20 | 1993-06-11 | Hitachi Ltd | マグネトロン応用装置 |
JP5138131B2 (ja) * | 2001-03-28 | 2013-02-06 | 忠弘 大見 | マイクロ波プラズマプロセス装置及びプラズマプロセス制御方法 |
KR100428511B1 (ko) * | 2002-05-27 | 2004-04-29 | 삼성전자주식회사 | 전자레인지 및 그 제어 방법 |
-
2004
- 2004-12-23 FR FR0413818A patent/FR2880235B1/fr not_active Expired - Fee Related
-
2005
- 2005-12-21 CA CA2594004A patent/CA2594004C/fr not_active Expired - Fee Related
- 2005-12-21 AU AU2005321172A patent/AU2005321172B2/en not_active Ceased
- 2005-12-21 WO PCT/FR2005/003223 patent/WO2006070107A1/fr active Application Filing
- 2005-12-21 KR KR1020077016980A patent/KR20070107681A/ko not_active Application Discontinuation
- 2005-12-21 DK DK05850568T patent/DK1829438T3/en active
- 2005-12-21 ES ES05850568.6T patent/ES2532261T3/es active Active
- 2005-12-21 CN CN2005800444872A patent/CN101147431B/zh not_active Expired - Fee Related
- 2005-12-21 RU RU2007123086/06A patent/RU2388195C2/ru not_active IP Right Cessation
- 2005-12-21 BR BRPI0519220-0A patent/BRPI0519220B1/pt not_active IP Right Cessation
- 2005-12-21 JP JP2007547570A patent/JP5107052B2/ja not_active Expired - Fee Related
- 2005-12-21 US US11/722,722 patent/US7928339B2/en not_active Expired - Fee Related
- 2005-12-21 EP EP05850568.6A patent/EP1829438B1/fr not_active Not-in-force
- 2005-12-22 TW TW094145885A patent/TWI389710B/zh not_active IP Right Cessation
-
2007
- 2007-06-12 IL IL183864A patent/IL183864A/en not_active IP Right Cessation
-
2008
- 2008-07-15 HK HK08107797.2A patent/HK1117327A1/xx not_active IP Right Cessation
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4317976A (en) * | 1978-06-28 | 1982-03-02 | Tokyo Shibaura Denki Kabushiki Kaisha | High frequency heating apparatus |
US4849595A (en) * | 1985-06-17 | 1989-07-18 | Robertshaw Controls Company | Electrically operated control device and system for a microwave oven |
EP0424365A2 (fr) * | 1987-07-06 | 1991-04-24 | Matsushita Electric Industrial Co., Ltd. | Dispositif de commande pour appareil électrique |
US5325020A (en) * | 1990-09-28 | 1994-06-28 | Abtox, Inc. | Circular waveguide plasma microwave sterilizer apparatus |
JPH06104079A (ja) * | 1992-09-16 | 1994-04-15 | Sanyo Electric Co Ltd | 高周波加熱装置 |
US6445596B1 (en) * | 1999-06-15 | 2002-09-03 | Matsushita Electric Industrial Co., Ltd. | Magnetron drive power supply |
Non-Patent Citations (1)
Title |
---|
PATENT ABSTRACTS OF JAPAN vol. 018, no. 372 (E - 1577) 13 July 1994 (1994-07-13) * |
Also Published As
Publication number | Publication date |
---|---|
BRPI0519220B1 (pt) | 2017-12-19 |
IL183864A (en) | 2013-11-28 |
JP2008525952A (ja) | 2008-07-17 |
EP1829438B1 (fr) | 2014-12-17 |
WO2006070107A8 (fr) | 2007-08-16 |
AU2005321172B2 (en) | 2011-04-28 |
US20090035196A1 (en) | 2009-02-05 |
US7928339B2 (en) | 2011-04-19 |
HK1117327A1 (en) | 2009-01-09 |
JP5107052B2 (ja) | 2012-12-26 |
CA2594004A1 (fr) | 2006-07-06 |
ES2532261T3 (es) | 2015-03-25 |
EP1829438A1 (fr) | 2007-09-05 |
DK1829438T3 (en) | 2015-03-02 |
IL183864A0 (en) | 2007-10-31 |
TWI389710B (zh) | 2013-03-21 |
CN101147431A (zh) | 2008-03-19 |
KR20070107681A (ko) | 2007-11-07 |
FR2880235A1 (fr) | 2006-06-30 |
RU2388195C2 (ru) | 2010-04-27 |
CA2594004C (fr) | 2017-03-14 |
TW200628177A (en) | 2006-08-16 |
AU2005321172A1 (en) | 2006-07-06 |
RU2007123086A (ru) | 2009-01-27 |
BRPI0519220A2 (pt) | 2009-01-06 |
CN101147431B (zh) | 2011-09-14 |
FR2880235B1 (fr) | 2007-03-30 |
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