WO2006083917A3 - Laser scanning interferometric surface metrology - Google Patents

Laser scanning interferometric surface metrology Download PDF

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Publication number
WO2006083917A3
WO2006083917A3 PCT/US2006/003480 US2006003480W WO2006083917A3 WO 2006083917 A3 WO2006083917 A3 WO 2006083917A3 US 2006003480 W US2006003480 W US 2006003480W WO 2006083917 A3 WO2006083917 A3 WO 2006083917A3
Authority
WO
WIPO (PCT)
Prior art keywords
region
probe
target
scanning
return signal
Prior art date
Application number
PCT/US2006/003480
Other languages
French (fr)
Other versions
WO2006083917A2 (en
Inventor
David Nolte
Manoj Varma
Fred E Regnier
Original Assignee
Purdue Research Foundation
David Nolte
Manoj Varma
Fred E Regnier
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Purdue Research Foundation, David Nolte, Manoj Varma, Fred E Regnier filed Critical Purdue Research Foundation
Publication of WO2006083917A2 publication Critical patent/WO2006083917A2/en
Publication of WO2006083917A3 publication Critical patent/WO2006083917A3/en

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
    • G01N21/45—Refractivity; Phase-affecting properties, e.g. optical path length using interferometric methods; using Schlieren methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N21/4788—Diffraction
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
    • G01N2021/757—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated using immobilised reagents
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
    • G01N21/77—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator
    • G01N2021/7769—Measurement method of reaction-produced change in sensor
    • G01N2021/7779—Measurement method of reaction-produced change in sensor interferometric
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T436/00—Chemistry: analytical and immunological testing
    • Y10T436/11—Automated chemical analysis
    • Y10T436/111666—Utilizing a centrifuge or compartmented rotor

Abstract

An apparatus for assessing topology of a surface of a target. The apparatus includes an optical source for generating a probe laser beam. The apparatus also includes means for scanning the probe laser beam across at least a portion of the surface of the target. The apparatus further includes a beamsplitter for redirecting a return signal toward means for detecting the return signal in a substantially quadrature condition, the return signal resulting from reflection of the probe laser beam off the surface of the target. A quadrature interferometric method for determining the presence or absence of a target analyte in a sample. The method comprises generating a laser probe beam having a wavelength λ and a waist W0 to probe at least a portion of a substrate having a reflecting surface that has been exposed to the sample. The reflecting surface includes at least a first region having a layer of recognition molecules specific to the target analyte and a second region that does not include a layer of recognition molecules specific to the target analyte. The method also comprises scanning the first region and the second region while the substrate is maintained in a substantially fixed position. The method further comprises measuring a time dependent intensity of a reflected diffraction signal of the probe beam while scanning the probe beam across the first region and the second region.
PCT/US2006/003480 2005-02-01 2006-02-01 Laser scanning interferometric surface metrology WO2006083917A2 (en)

Applications Claiming Priority (10)

Application Number Priority Date Filing Date Title
US64907105P 2005-02-01 2005-02-01
US64904305P 2005-02-01 2005-02-01
US64907005P 2005-02-01 2005-02-01
US64872405P 2005-02-01 2005-02-01
US60/649,043 2005-02-01
US60/648,724 2005-02-01
US60/649,070 2005-02-01
US60/649,071 2005-02-01
US75517705P 2005-12-30 2005-12-30
US60/755,177 2005-12-30

Publications (2)

Publication Number Publication Date
WO2006083917A2 WO2006083917A2 (en) 2006-08-10
WO2006083917A3 true WO2006083917A3 (en) 2007-08-30

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2006/003480 WO2006083917A2 (en) 2005-02-01 2006-02-01 Laser scanning interferometric surface metrology

Country Status (2)

Country Link
US (2) US7405831B2 (en)
WO (1) WO2006083917A2 (en)

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US20060256350A1 (en) 2006-11-16

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