WO2007134000A3 - Long-range gap detection with interferometric sensitivity using spatial phase of interference patterns - Google Patents

Long-range gap detection with interferometric sensitivity using spatial phase of interference patterns Download PDF

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Publication number
WO2007134000A3
WO2007134000A3 PCT/US2007/068349 US2007068349W WO2007134000A3 WO 2007134000 A3 WO2007134000 A3 WO 2007134000A3 US 2007068349 W US2007068349 W US 2007068349W WO 2007134000 A3 WO2007134000 A3 WO 2007134000A3
Authority
WO
WIPO (PCT)
Prior art keywords
grating
long
interference patterns
spatial phase
gap detection
Prior art date
Application number
PCT/US2007/068349
Other languages
French (fr)
Other versions
WO2007134000A2 (en
Inventor
Euclid E Moon
Original Assignee
Massachusetts Inst Technology
Euclid E Moon
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Massachusetts Inst Technology, Euclid E Moon filed Critical Massachusetts Inst Technology
Publication of WO2007134000A2 publication Critical patent/WO2007134000A2/en
Publication of WO2007134000A3 publication Critical patent/WO2007134000A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/703—Gap setting, e.g. in proximity printer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7038—Alignment for proximity or contact printer

Abstract

An apparatus and method measures the gap between one substantially planar object, such as a mask, and a second planar object, such as a substrate. A gapping mark is used for measuring a gap between the first and second plates. The gapping mark includes a first grating (100) on a first surface of a first plate, the first grating having a first uniform period (P1) in a first direction. A second grating (110) is located on the first surface of the first plate, the second grating being adjacent to the first grating in the first direction, the second grating having a second uniform period (P2) in the first direction. The gapping mark also includes a third grating (120) on the first surface of the first plate, the third grating being adjacent to the first grating in a second direction, the second direction being substantially orthogonal to the first direction, the third grating having the second uniform period (P2) in the first direction. A fourth grating (130) is located on the first surface of the first plate, the fourth grating being adjacent to the third grating in the first direction.
PCT/US2007/068349 2006-05-11 2007-05-07 Long-range gap detection with interferometric sensitivity using spatial phase of interference patterns WO2007134000A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/432,574 US7247843B1 (en) 2006-05-11 2006-05-11 Long-range gap detection with interferometric sensitivity using spatial phase of interference patterns
US11/432,574 2006-05-11

Publications (2)

Publication Number Publication Date
WO2007134000A2 WO2007134000A2 (en) 2007-11-22
WO2007134000A3 true WO2007134000A3 (en) 2008-05-02

Family

ID=38266850

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2007/068349 WO2007134000A2 (en) 2006-05-11 2007-05-07 Long-range gap detection with interferometric sensitivity using spatial phase of interference patterns

Country Status (2)

Country Link
US (1) US7247843B1 (en)
WO (1) WO2007134000A2 (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009509156A (en) * 2005-09-21 2009-03-05 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ System for detecting the motion of an object
WO2007121208A2 (en) * 2006-04-11 2007-10-25 Massachusetts Institute Of Technology Nanometer-precision tip-to-substrate control and pattern registration for scanning-probe lithography
CN100526994C (en) * 2007-08-20 2009-08-12 上海微电子装备有限公司 Transmission aligning mark combination and alignment method of light scribing device
DE102009019140B4 (en) * 2009-04-29 2017-03-02 Carl Zeiss Smt Gmbh Method for calibrating a position measuring device and method for measuring a mask
JP5419634B2 (en) * 2009-10-26 2014-02-19 株式会社東芝 Pattern formation method
CN109564391A (en) 2016-07-21 2019-04-02 Asml荷兰有限公司 Measure mesh calibration method, substrate, measurement equipment and lithographic equipment
US9899183B1 (en) * 2016-07-28 2018-02-20 Globalfoundries Inc. Structure and method to measure focus-dependent pattern shift in integrated circuit imaging
CN108121172B (en) * 2017-12-13 2019-09-10 中国科学院光电技术研究所 A kind of multilayer film absolute interstitial measuring device and method based on white light interference information matches
US10705435B2 (en) 2018-01-12 2020-07-07 Globalfoundries Inc. Self-referencing and self-calibrating interference pattern overlay measurement
CN111752112B (en) * 2019-03-27 2021-09-10 上海微电子装备（集团）股份有限公司 Mask alignment mark combination, mask alignment system, photoetching device and method thereof
US11256177B2 (en) 2019-09-11 2022-02-22 Kla Corporation Imaging overlay targets using Moiré elements and rotational symmetry arrangements
US11686576B2 (en) 2020-06-04 2023-06-27 Kla Corporation Metrology target for one-dimensional measurement of periodic misregistration
US11796925B2 (en) 2022-01-03 2023-10-24 Kla Corporation Scanning overlay metrology using overlay targets having multiple spatial frequencies

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4656347A (en) * 1984-01-30 1987-04-07 Nippon Telegraph & Telephone Public Corporation Diffraction grating position adjuster using a grating and a reflector
EP0336537A1 (en) * 1988-02-16 1989-10-11 Canon Kabushiki Kaisha Device for detecting positional relationship between two objects
WO2000072093A1 (en) * 1999-05-25 2000-11-30 Massachusetts Institute Of Technology Optical gap measuring apparatus and method using two-dimensional grating mark with chirp in one direction
WO2007121208A2 (en) * 2006-04-11 2007-10-25 Massachusetts Institute Of Technology Nanometer-precision tip-to-substrate control and pattern registration for scanning-probe lithography

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5216257A (en) * 1990-07-09 1993-06-01 Brueck Steven R J Method and apparatus for alignment and overlay of submicron lithographic features
US5414514A (en) * 1993-06-01 1995-05-09 Massachusetts Institute Of Technology On-axis interferometric alignment of plates using the spatial phase of interference patterns
US5808742A (en) * 1995-05-31 1998-09-15 Massachusetts Institute Of Technology Optical alignment apparatus having multiple parallel alignment marks
US7068833B1 (en) * 2000-08-30 2006-06-27 Kla-Tencor Corporation Overlay marks, methods of overlay mark design and methods of overlay measurements
US6699624B2 (en) * 2001-02-27 2004-03-02 Timbre Technologies, Inc. Grating test patterns and methods for overlay metrology

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4656347A (en) * 1984-01-30 1987-04-07 Nippon Telegraph & Telephone Public Corporation Diffraction grating position adjuster using a grating and a reflector
EP0336537A1 (en) * 1988-02-16 1989-10-11 Canon Kabushiki Kaisha Device for detecting positional relationship between two objects
WO2000072093A1 (en) * 1999-05-25 2000-11-30 Massachusetts Institute Of Technology Optical gap measuring apparatus and method using two-dimensional grating mark with chirp in one direction
WO2007121208A2 (en) * 2006-04-11 2007-10-25 Massachusetts Institute Of Technology Nanometer-precision tip-to-substrate control and pattern registration for scanning-probe lithography

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
MOON EUCLID E ET AL: "Novel mask-wafer gap measurement scheme with nanometer-level detectivity", JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B: MICROELECTRONICS PROCESSING AND PHENOMENA, AMERICAN VACUUM SOCIETY, NEW YORK, NY, US, vol. 17, no. 6, November 1999 (1999-11-01), pages 2698 - 2702, XP012007800, ISSN: 0734-211X *

Also Published As

Publication number Publication date
US7247843B1 (en) 2007-07-24
WO2007134000A2 (en) 2007-11-22

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