WO2008011296A2 - Process and system for quality management and analysis of via drilling - Google Patents

Process and system for quality management and analysis of via drilling Download PDF

Info

Publication number
WO2008011296A2
WO2008011296A2 PCT/US2007/073103 US2007073103W WO2008011296A2 WO 2008011296 A2 WO2008011296 A2 WO 2008011296A2 US 2007073103 W US2007073103 W US 2007073103W WO 2008011296 A2 WO2008011296 A2 WO 2008011296A2
Authority
WO
WIPO (PCT)
Prior art keywords
capture pad
value
blind via
appearance
laser
Prior art date
Application number
PCT/US2007/073103
Other languages
French (fr)
Other versions
WO2008011296A3 (en
Inventor
Hisashi Matsumoto
Mark Singer
Leo Baldwin
Jeffrey E. Howerton
David V. Childers
Original Assignee
Electro Scientific Industries, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Electro Scientific Industries, Inc. filed Critical Electro Scientific Industries, Inc.
Priority to DE112007001549T priority Critical patent/DE112007001549T5/en
Priority to JP2009519620A priority patent/JP5330991B2/en
Priority to GB0900113A priority patent/GB2453286A/en
Priority to CN2007800258810A priority patent/CN101490826B/en
Publication of WO2008011296A2 publication Critical patent/WO2008011296A2/en
Publication of WO2008011296A3 publication Critical patent/WO2008011296A3/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/34Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies not provided for in groups H01L21/0405, H01L21/0445, H01L21/06, H01L21/16 and H01L21/18 with or without impurities, e.g. doping materials
    • H01L21/46Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/428
    • H01L21/461Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/428 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/4763Deposition of non-insulating, e.g. conductive -, resistive -, layers on insulating layers; After-treatment of these layers
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0011Working of insulating substrates or insulating layers
    • H05K3/0017Etching of the substrate by chemical or physical means
    • H05K3/0026Etching of the substrate by chemical or physical means by laser ablation
    • H05K3/0032Etching of the substrate by chemical or physical means by laser ablation of organic insulating material
    • H05K3/0035Etching of the substrate by chemical or physical means by laser ablation of organic insulating material of blind holes, i.e. having a metal layer at the bottom
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/03Observing, e.g. monitoring, the workpiece
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/38Removing material by boring or cutting
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/38Removing material by boring or cutting
    • B23K26/382Removing material by boring or cutting by boring
    • B23K26/389Removing material by boring or cutting by boring of fluid openings, e.g. nozzles, jets
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B44DECORATIVE ARTS
    • B44CPRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
    • B44C1/00Processes, not specifically provided for elsewhere, for producing decorative surface effects
    • B44C1/22Removing surface-material, e.g. by engraving, by etching
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01LMEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L21/00Vacuum gauges
    • G01L21/30Vacuum gauges by making use of ionisation effects
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42Plated through-holes or plated via connections
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2101/00Articles made by soldering, welding or cutting
    • B23K2101/36Electric or electronic devices
    • B23K2101/42Printed circuits
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0266Marks, test patterns or identification means
    • H05K1/0269Marks, test patterns or identification means for visual or optical inspection
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09Shape and layout
    • H05K2201/09209Shape and layout details of conductors
    • H05K2201/09372Pads and lands
    • H05K2201/09454Inner lands, i.e. lands around via or plated through-hole in internal layer of multilayer PCB
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/16Inspection; Monitoring; Aligning
    • H05K2203/163Monitoring a manufacturing process

Definitions

  • the present invention relates to a process and system for laser forming blind vias in at least one layer of a circuit substrate having a plurality of capture pads of varying geometry.
  • CAD computer aided design
  • UV laser and image projection processing has been used for drilling blind via in integrated circuits (IC) packaging substrates.
  • the current process typically applies a single set of laser operating parameters to all vias or holes that are intended to yield the same geometry between two layers in a printed circuit design.
  • capture pad geometry due to varying capture pad geometry, the end results are sometimes less than desirable.
  • the results vary from "dark" copper when drilling in a solid copper plane, to delaminated copper on 110 micrometer (Mm) copper capture pads.
  • a process for laser forming a blind via in at least one layer of a circuit substrate having a plurality of capture pads of varying geometry can include for at least one blind via to be formed in at least one layer of a circuit substrate, evaluating a capture pad geometry value (such as area and/or volume) within a predetermined distance from a drilling location with respect to a blind via geometry value (such as area and/or volume) to be formed at the drilling location.
  • the process can also include setting at least one laser operating parameter based on the evaluation in order to obtain a desired capture pad appearance after blind via formation.
  • a process for laser forming a blind via in at least one layer of a circuit substrate having a plurality of capture pads of varying geometry can include imaging a capture pad area defined as an area within a predetermined distance from a blind via drilling location in at least one layer of a circuit substrate, quantifying an appearance value for the imaged capture pad area, and determining acceptability of the imaged capture pad area based on the quantified appearance value.
  • FIG. 1 is a simplified schematic view of a system for laser forming vias in at least one layer of a circuit substrate having a plurality of capture pads of varying geometry;
  • FIG. 2 is a detail of a CAD/CAM circuit layout pattern having a plurality of capture pads of varying geometry, where a blind via is to be drilled in a center of a capture pad, and where a phantom circle defines a capture pad area within a predetermined distance from a drilling location;
  • FIG. 3 is a cross-seclional view taken as shown in FIG. 2 illustrating stacked v ⁇ as and vias drilled in a plurality of capture pads of varying geometry;
  • FIGS . 4A through 4E illustrate a comparison of copper appearance in drilled blind via using different laser operating parameters, or applying a fixed set of laser operating parameters to capture pads of varying geometry, where FIG. 4 A corresponds to a subjective "shiny" surface texture, FIG 4C corresponds to a subjective "matt” or “grainy” surface texture and FIG. 4E corresponds to a subjective "dark” surface texture; and
  • FIG. 5 illustrates a simplified schematic flow diagram of a process for laser forming a blind via in at least one layer of a circuit substrate having a plurality of capture pads of varying geometry.
  • a process or method for quality management and analysis of blind via can include a CAD/CAM system 10 including circuit layout design data.
  • the CAD design data can include at least one layer of a circuit substrate having a plurality of capture pads of varying geometry including drilling locations and sizes for forming vias and/or blind vias therein.
  • the CAD design data can be transferred by any suitable means, schematically illustrated as arrow 12, to a laser processing system 14.
  • laser operating parameters can be set or associated with the CAD design data received from the CAD/CAM system in order to laser form a via or blind via in at least one layer of the circuit substrate.
  • the process can then include an imaging device or station 16 located in-line (or on-line) or off-line, to analyze pad and via location to generate a quality index or appearance value.
  • Quality index value information can be fed back to the laser processing system 14 through any suitable means, schematically illustrated as arrow 18 for laser operating parameter verification, adjustment or optimization, and/or can be fed back to the CAD/CAM system 10 through any suitable means, schematically illustrated as arrow 20, for verification, adjustment or optimization of the location/geometry of formed via and capture pads, and for mapping quality index or appearance values corresponding to each location/geometry.
  • the present invention can be used for quality management and analysis and/or as a feedback signal to the prior design and/or processing systems in order to verify and/or adjust current locations, geometries and/or operating parameters in order to obtain a desired capture pad appearance after blind via formation.
  • a CAD/CAM circuit layout pattern 22 is illustrated in detail where a plurality of capture pads 24 of varying geometry are to be formed with a blind via 26 in a drilling location associated with the capture pad.
  • the outer phantom perimeter 28 illustrates a radial distance or other predetermined distance for analysis where copper capture pad appearance is not affected outside the boundary of perimeter 28.
  • Copper pad geometry data along with via drilling size, can be used to evaluate a capture pad geometry value connected to a drilling location within a predetermined distance from the drilling location versus a blind via geometry value to be formed at the drilling location.
  • the evaluation can include value comparison, and/or lookup tables, and/or calculations, or the like.
  • a ratio of capture pad geometry value to blind via geometry value can be calculated in order to rank the ratios into predetermined ranges associated with the use of different laser processing parameters.
  • the CAD system 10 can send blind via drill location/geometry information, capture pad location/geometry information, and/or pad/via geometry ratio or corresponding laser operating parameters to the laser drill system 14.
  • an evaluation of the capture pad geometry value with respect to the blind via geometry value can be performed and/or the values can be ranked by the laser drill system, so that different laser operating parameters can be applied.
  • the CAD system can segregate a geometry value, such as a single-tool drill file, into a multi-tool drill file based on the evaluation of capture pad geometry value (such as area and/or volume) with respect to blind via geometry value (such as area and/or volume), as evaluated in the CAD system.
  • the analysis can also include a comparison to previous drill steps to determine if stacked vias (such as that illustrated to the left of FIG. 3) are present.
  • separate laser drill files can be generated based on capture pad geometry value to blind via geometry value ratios ranked into different groups to set different laser operating parameters for each group, such as a destination layer, laser fluence, number of pulses, pulse width, or any combination thereof.
  • stacked blind vias can be assigned a destination layer value of 14; ratios in the range of 1% to 13% can be assigned a destination layer value of 15; ratios greater than 13% and up to 17% can be assigned a destination layer value of 16; ratios greater than 17% and up to 20% can be assigned a destination layer value of 17; and ratios greater than 20% up to 100% can be assigned a destination of layer value of 18.
  • a multi tool drill file can be generated based on the ratio of via geometry value (e.g. area or volume) versus capture pad geometry (e.g. area or volume) as evaluated in the CAD system, or in the laser processing system, or any combination thereof.
  • the imaging device or station 16 can evaluate and quantify an appearance of the capture pad after via formation.
  • the appearance of the capture pad can vary from "dark" copper when drilling in a solid copper plane (illustrated in FIG. 4E) to de laminated copper on 110 micrometer ( ⁇ m) copper pads (illustrated in FIG. 4A). Copper appearances can also vary in drilled blind via using different laser parameters.
  • the appearance illustrated in FIG. 4A is typically referred to by the descriptive subjective term "shiny" surface texture.
  • the copper appearance illustrated in FIG. 4C is typically referred to by the descriptive subjective term "matt" or "grainy” surface texture.
  • FIG. 4E is typically referred to by the descriptive subjective term "dark” surface texture.
  • FIG. 4B illustrates a copper appearance which falls between what is subjectively referred to as “shiny” and “matt” surface textures.
  • FIG. 4D illustrates a copper appearance that falls between the subjective description of "dark” and “matt” surface textures.
  • the subjective character of the terms used to describe the copper capture pad appearance after blind via formation has hindered quality control and processing control efforts.
  • the present invention according to one embodiment can use a vision system 16 to quantify an appearance of the capture pad. This enables a user to reference copper appearance as a number, rather than as merely a descriptive subjective term.
  • the process or method according to one embodiment of the present invention can include performing a histogram analysis and/or fractal dimension analysis to provide at least one numerical appearance value. For example, if the "matt" or "grainy" surface texture of a copper capture pad is preserved during laser machining of a blind via, then the fractal dimension will be high (salt and pepper effect) and the intensity distribution in the histogram will be bimodal with roughly equal area in each intensity group.
  • the properties of an image of a capture pad can be quantified by a number for fractal dimension and by a number for the symmetry between two populations in the histogram.
  • a higher fractal dimension value can correspond to a "matt" or "grainy” surface texture of a copper capture pad.
  • a lower fractal dimension value can correspond to a "shiny" surface texture of a copper capture pad.
  • a histogram value approximating unity (one) can correspond to a "matt” or “grainy” surface texture of a copper capture pad.
  • a histogram value less than unity (one) can correspond to a "shiny” surface texture or a copper capture pad.
  • a histogram value greater than unity (one) can correspond to a "dark” surface texture of a copper capture pad.
  • the quantified numbers can be transferred back to the laser processing system 14 and/or CAD/CAM system 10 to verify, adjust, and/or optimize the laser processing parameters in order to minimize the quality variance in drilling results over an entire circuit pattern.
  • the CAD/CAM system can analyze a relation between pad geometry and via quality with the quantified numbers from the vision imaging device or station 16.
  • the vision imaging device or a station 16 can also perform other measurements, such as top/bottom diameter and circularity measurements.
  • a process for laser forming a blind via in at least one layer of a circuit substrate having a plurality of capture pads of varying geometry can include for at least one blind via to be formed in at least one layer of a circuit substrate, evaluating a capture pad geometry value (such as area and/or volume) within predetermined distance from a drilling location with respect to a blind via geometry value (such as area and/or volume) to be formed at the drilling location.
  • the process can include setting at least one laser operating parameter based on the evaluation in order to obtain a desired capture pad appearance after blind via formation.
  • the at least one laser process parameter to be set can be selected from a group consisting of laser fluence, number of laser pulses, laser pulse width and any combination thereof.
  • the process can include comparing a given drill layer to an adjacent drill layer to determine if blind vias are stacked one on top of another.
  • the process according to one embodiment of the present invention can include defining a drill layer, defining a scan area adjacent a drill location in the defined drill layer, defining a set of evaluation ranges, wherein the evaluation ranges can include calculated ratios defined as a capture pad geometry value (such as area and/or volume) within a predetermined distance from a drilling location with respect to a blind via geometry value (such as area and/or volume) to be formed at the drilling location, 'and selecting a destination layer for drill tools corresponding to a particular set of ratio ranges.
  • a capture pad geometry value such as area and/or volume
  • a blind via geometry value such as area and/or volume
  • a process according to one embodiment of the present invention can include imaging a capture pad area defined as an area within a predetermined distance from a blind via drilling location in at least one layer of a circuit substrate, quantifying an appearance value for the imaged capture pad area, and determining acceptability of the imaged capture pad area based on the quantified appearance value.
  • the appearance value can be quantified as a numeric appearance value for the imaged capture pad area to minimize subjectivity in a quality judgment of a laser-formed blind via in the imaged capture pad area.
  • the numeric appearance value can be obtained according to an embodiment of the present invention by performing a fractal dimension analysis on the imaged capture pad area to obtain a numeric value for fractal dimension, where a higher value corresponds to a subjective "matt” or “grainy” surface texture and a lower value correspondence to a subjective "shiny" surface texture for the imaged capture pad area.
  • the numeric appearance value can be obtained according to an embodiment of the present invention by performing a histogram analysis on the imaged capture pad area to obtain a numeric value for symmetry between populations in the histogram, where a value approximating unity (one) corresponds to a subjective "matt” or “grainy” surface texture, a value smaller than unity (one) corresponds to a subjective "shiny” surface texture and a value greater than unity (one) corresponds to a subjective "dark” surface texture of the imaged capture pad area.
  • the numerical appearance value according to an embodiment of the present invention can include performing a histogram analysis and a fractal dimension analysis on the imaged capture pad area to quantify one or more numeric appearance values for the image capture pad area.
  • Acceptability of the imaged capture pad area can be based on the quantified appearance value.
  • the process can include analyzing a relationship between capture pad geometry value (such as area and/or volume) with respect to blind via geometry value (such as area and/or volume) for evaluation/comparison with respect to at least one appearance value for a plurality of imaged capture pad areas to minimize variance in quality of laser formed blind via over an entire circuit pattern.
  • At least one laser processing parameter can be verified, adjusted, and/or optimized based on the relationship analyzed between the capture pad geometry value (such as area and/or volume) with respect to blind via geometry value (such as area and/or volume) and at least one appearance value for a plurality of captured pad areas with laser formed blind via located in the imaged capture pad areas.

Abstract

A process for laser forming a blind via in at least one layer of a circuit substrate having a plurality of capture pads of varying geometry can include, for at least one blind via to be formed in at least one layer of a circuit substrate, evaluating a capture pad geometry value (such as area and/or volume) within a predetermined distance from a drilling location with respect to a blind via geometry value (such as area and/or volume) to be formed at the drilling location. The process can include setting at least one laser operating parameter based on the evaluation in order to obtain a desired capture pad appearance after blind via formation. The process can include imaging a capture pad area defined as an area within a predetermined distance from a blind via drilling location in at least one layer of a circuit substrate, quantifying at least one appearance value for the imaged capture pad area, and determining an acceptability of the imaged capture pad areas based on the quantified appearance value.

Description

PROCESS AND SYSTEM FOR QUALITY MANAGEMENT AND ANALYSIS OF VIA DRILLING
FIELD OF THE INVENTION
[0001] The present invention relates to a process and system for laser forming blind vias in at least one layer of a circuit substrate having a plurality of capture pads of varying geometry.
BACKGROUND OF THE INVENTION
[0002] The use of a pre-etched window as a mask for laser drilling blind vias in a multi-layer circuit board is generally known. Dense pin count and/or dense component placement on multi-layer circuit boards or polymer based multi-chip modules can create an interconnect density problem referred to in the industry as "via starvation". One solution to the problem of "via starvation" is the formation of blind vias interconnecting one or more layers in a rrmlti- layer circuit board or multi-chip module. [0003] One quality criteria in blind via formation is copper capture pad appearance. Capture pad appearance is sometimes referred to as "shiny", "melted too much", or "dark", and tends to be a very subjective criteria. Some customers specify the desired process parameter by this subjective measure in addition to throughput considerations. It has been observed that laser operating parameters affect the appearance of the copper capture pad. For high fiuence process, the pad tends to be melted showing a "shiny" appearance. When the fiuence is set very low, the appearance is somewhat "dark". The number of pulses applied to the material can also affect the appearance. Another observation is that the appearance varies depending on the laser operating parameter or characteristics, such as pulse width. It has also been observed that the appearance varies depending on the capture pad geometry even when the same laser processing parameters are used. When a variation in quality is observed in the entire panel process, it is sometimes difficult to resolve the source of the quality variation, since data coming from the computer aided design (CAD) system relates only to the desired drilling location.
[0004] Ultraviolet (UV) laser and image projection processing has been used for drilling blind via in integrated circuits (IC) packaging substrates. The current process typically applies a single set of laser operating parameters to all vias or holes that are intended to yield the same geometry between two layers in a printed circuit design. However, due to varying capture pad geometry, the end results are sometimes less than desirable. When applying a fixed set of laser operating parameters, the results vary from "dark" copper when drilling in a solid copper plane, to delaminated copper on 110 micrometer (Mm) copper capture pads.
SUMMARY OF THE INVENTION
[0005] A process for laser forming a blind via in at least one layer of a circuit substrate having a plurality of capture pads of varying geometry can include for at least one blind via to be formed in at least one layer of a circuit substrate, evaluating a capture pad geometry value (such as area and/or volume) within a predetermined distance from a drilling location with respect to a blind via geometry value (such as area and/or volume) to be formed at the drilling location. The process can also include setting at least one laser operating parameter based on the evaluation in order to obtain a desired capture pad appearance after blind via formation.
[0006] A process for laser forming a blind via in at least one layer of a circuit substrate having a plurality of capture pads of varying geometry can include imaging a capture pad area defined as an area within a predetermined distance from a blind via drilling location in at least one layer of a circuit substrate, quantifying an appearance value for the imaged capture pad area, and determining acceptability of the imaged capture pad area based on the quantified appearance value.
[0007] Other applications of the present invention will become apparent to those skilled in the art when the following description of the best mode contemplated for practicing the invention is read in conjunction with the accompanying drawings.
BRIEF DESCRIPTION OF THE DRAWINGS
[0008] The description herein makes reference to the accompanying drawings wherein like reference numerals refer to like parts throughout the several views, and wherein:
[0009] FIG. 1 is a simplified schematic view of a system for laser forming vias in at least one layer of a circuit substrate having a plurality of capture pads of varying geometry;
[0010] FIG. 2 is a detail of a CAD/CAM circuit layout pattern having a plurality of capture pads of varying geometry, where a blind via is to be drilled in a center of a capture pad, and where a phantom circle defines a capture pad area within a predetermined distance from a drilling location;
[0011] FIG. 3 is a cross-seclional view taken as shown in FIG. 2 illustrating stacked vϊas and vias drilled in a plurality of capture pads of varying geometry; [0012] FIGS . 4A through 4E illustrate a comparison of copper appearance in drilled blind via using different laser operating parameters, or applying a fixed set of laser operating parameters to capture pads of varying geometry, where FIG. 4 A corresponds to a subjective "shiny" surface texture, FIG 4C corresponds to a subjective "matt" or "grainy" surface texture and FIG. 4E corresponds to a subjective "dark" surface texture; and
[0013] FIG. 5 illustrates a simplified schematic flow diagram of a process for laser forming a blind via in at least one layer of a circuit substrate having a plurality of capture pads of varying geometry.
DETAILED DESCRIPTION
[0014] Referring now to FIG. 1, a process or method for quality management and analysis of blind via can include a CAD/CAM system 10 including circuit layout design data. The CAD design data can include at least one layer of a circuit substrate having a plurality of capture pads of varying geometry including drilling locations and sizes for forming vias and/or blind vias therein. The CAD design data can be transferred by any suitable means, schematically illustrated as arrow 12, to a laser processing system 14. Using the location of a via and/or a blind via to be drilled and pad location and/or geometry as a reference image, laser operating parameters can be set or associated with the CAD design data received from the CAD/CAM system in order to laser form a via or blind via in at least one layer of the circuit substrate. The process can then include an imaging device or station 16 located in-line (or on-line) or off-line, to analyze pad and via location to generate a quality index or appearance value. Quality index value information can be fed back to the laser processing system 14 through any suitable means, schematically illustrated as arrow 18 for laser operating parameter verification, adjustment or optimization, and/or can be fed back to the CAD/CAM system 10 through any suitable means, schematically illustrated as arrow 20, for verification, adjustment or optimization of the location/geometry of formed via and capture pads, and for mapping quality index or appearance values corresponding to each location/geometry. [0015] It should be recognized that the present invention can be used for quality management and analysis and/or as a feedback signal to the prior design and/or processing systems in order to verify and/or adjust current locations, geometries and/or operating parameters in order to obtain a desired capture pad appearance after blind via formation.
[0016] Referring now to FIGS. 2 and 3, a CAD/CAM circuit layout pattern 22 is illustrated in detail where a plurality of capture pads 24 of varying geometry are to be formed with a blind via 26 in a drilling location associated with the capture pad. The outer phantom perimeter 28 illustrates a radial distance or other predetermined distance for analysis where copper capture pad appearance is not affected outside the boundary of perimeter 28. Copper pad geometry data, along with via drilling size, can be used to evaluate a capture pad geometry value connected to a drilling location within a predetermined distance from the drilling location versus a blind via geometry value to be formed at the drilling location. The evaluation can include value comparison, and/or lookup tables, and/or calculations, or the like. By way of example and not limitation, a ratio of capture pad geometry value to blind via geometry value can be calculated in order to rank the ratios into predetermined ranges associated with the use of different laser processing parameters. The CAD system 10 can send blind via drill location/geometry information, capture pad location/geometry information, and/or pad/via geometry ratio or corresponding laser operating parameters to the laser drill system 14. Alternatively, an evaluation of the capture pad geometry value with respect to the blind via geometry value can be performed and/or the values can be ranked by the laser drill system, so that different laser operating parameters can be applied. Alternatively, the CAD system can segregate a geometry value, such as a single-tool drill file, into a multi-tool drill file based on the evaluation of capture pad geometry value (such as area and/or volume) with respect to blind via geometry value (such as area and/or volume), as evaluated in the CAD system. The analysis can also include a comparison to previous drill steps to determine if stacked vias (such as that illustrated to the left of FIG. 3) are present. By way of example and not limitation, separate laser drill files can be generated based on capture pad geometry value to blind via geometry value ratios ranked into different groups to set different laser operating parameters for each group, such as a destination layer, laser fluence, number of pulses, pulse width, or any combination thereof. By way of example and not limitation, stacked blind vias can be assigned a destination layer value of 14; ratios in the range of 1% to 13% can be assigned a destination layer value of 15; ratios greater than 13% and up to 17% can be assigned a destination layer value of 16; ratios greater than 17% and up to 20% can be assigned a destination layer value of 17; and ratios greater than 20% up to 100% can be assigned a destination of layer value of 18. A multi tool drill file can be generated based on the ratio of via geometry value (e.g. area or volume) versus capture pad geometry (e.g. area or volume) as evaluated in the CAD system, or in the laser processing system, or any combination thereof.
[0017] The imaging device or station 16 can evaluate and quantify an appearance of the capture pad after via formation. As can be seen in FIGS. 4 A through 4E, when applying a fixed set of laser processing parameters, the appearance of the capture pad can vary from "dark" copper when drilling in a solid copper plane (illustrated in FIG. 4E) to de laminated copper on 110 micrometer (μm) copper pads (illustrated in FIG. 4A). Copper appearances can also vary in drilled blind via using different laser parameters. For example, the appearance illustrated in FIG. 4A is typically referred to by the descriptive subjective term "shiny" surface texture. The copper appearance illustrated in FIG. 4C is typically referred to by the descriptive subjective term "matt" or "grainy" surface texture. The copper appearance illustrated in FIG. 4E is typically referred to by the descriptive subjective term "dark" surface texture. FIG. 4B illustrates a copper appearance which falls between what is subjectively referred to as "shiny" and "matt" surface textures. FIG. 4D illustrates a copper appearance that falls between the subjective description of "dark" and "matt" surface textures. The subjective character of the terms used to describe the copper capture pad appearance after blind via formation has hindered quality control and processing control efforts. The present invention according to one embodiment can use a vision system 16 to quantify an appearance of the capture pad. This enables a user to reference copper appearance as a number, rather than as merely a descriptive subjective term. The process or method according to one embodiment of the present invention can include performing a histogram analysis and/or fractal dimension analysis to provide at least one numerical appearance value. For example, if the "matt" or "grainy" surface texture of a copper capture pad is preserved during laser machining of a blind via, then the fractal dimension will be high (salt and pepper effect) and the intensity distribution in the histogram will be bimodal with roughly equal area in each intensity group. The properties of an image of a capture pad can be quantified by a number for fractal dimension and by a number for the symmetry between two populations in the histogram. A higher fractal dimension value can correspond to a "matt" or "grainy" surface texture of a copper capture pad. A lower fractal dimension value can correspond to a "shiny" surface texture of a copper capture pad. A histogram value approximating unity (one) can correspond to a "matt" or "grainy" surface texture of a copper capture pad. A histogram value less than unity (one) can correspond to a "shiny" surface texture or a copper capture pad. A histogram value greater than unity (one) can correspond to a "dark" surface texture of a copper capture pad. The quantified numbers can be transferred back to the laser processing system 14 and/or CAD/CAM system 10 to verify, adjust, and/or optimize the laser processing parameters in order to minimize the quality variance in drilling results over an entire circuit pattern. The CAD/CAM system can analyze a relation between pad geometry and via quality with the quantified numbers from the vision imaging device or station 16. The vision imaging device or a station 16 can also perform other measurements, such as top/bottom diameter and circularity measurements.
[0018] In operation, a process for laser forming a blind via in at least one layer of a circuit substrate having a plurality of capture pads of varying geometry can include for at least one blind via to be formed in at least one layer of a circuit substrate, evaluating a capture pad geometry value (such as area and/or volume) within predetermined distance from a drilling location with respect to a blind via geometry value (such as area and/or volume) to be formed at the drilling location. The process can include setting at least one laser operating parameter based on the evaluation in order to obtain a desired capture pad appearance after blind via formation. The at least one laser process parameter to be set can be selected from a group consisting of laser fluence, number of laser pulses, laser pulse width and any combination thereof. The process can include comparing a given drill layer to an adjacent drill layer to determine if blind vias are stacked one on top of another.
[0019] The process according to one embodiment of the present invention can include defining a drill layer, defining a scan area adjacent a drill location in the defined drill layer, defining a set of evaluation ranges, wherein the evaluation ranges can include calculated ratios defined as a capture pad geometry value (such as area and/or volume) within a predetermined distance from a drilling location with respect to a blind via geometry value (such as area and/or volume) to be formed at the drilling location, 'and selecting a destination layer for drill tools corresponding to a particular set of ratio ranges. [0020] A process according to one embodiment of the present invention can include imaging a capture pad area defined as an area within a predetermined distance from a blind via drilling location in at least one layer of a circuit substrate, quantifying an appearance value for the imaged capture pad area, and determining acceptability of the imaged capture pad area based on the quantified appearance value. The appearance value can be quantified as a numeric appearance value for the imaged capture pad area to minimize subjectivity in a quality judgment of a laser-formed blind via in the imaged capture pad area. The numeric appearance value can be obtained according to an embodiment of the present invention by performing a fractal dimension analysis on the imaged capture pad area to obtain a numeric value for fractal dimension, where a higher value corresponds to a subjective "matt" or "grainy" surface texture and a lower value correspondence to a subjective "shiny" surface texture for the imaged capture pad area. The numeric appearance value can be obtained according to an embodiment of the present invention by performing a histogram analysis on the imaged capture pad area to obtain a numeric value for symmetry between populations in the histogram, where a value approximating unity (one) corresponds to a subjective "matt" or "grainy" surface texture, a value smaller than unity (one) corresponds to a subjective "shiny" surface texture and a value greater than unity (one) corresponds to a subjective "dark" surface texture of the imaged capture pad area. The numerical appearance value according to an embodiment of the present invention can include performing a histogram analysis and a fractal dimension analysis on the imaged capture pad area to quantify one or more numeric appearance values for the image capture pad area.
[0021] Acceptability of the imaged capture pad area according to an embodiment of the present invention can be based on the quantified appearance value. The process can include analyzing a relationship between capture pad geometry value (such as area and/or volume) with respect to blind via geometry value (such as area and/or volume) for evaluation/comparison with respect to at least one appearance value for a plurality of imaged capture pad areas to minimize variance in quality of laser formed blind via over an entire circuit pattern. At least one laser processing parameter can be verified, adjusted, and/or optimized based on the relationship analyzed between the capture pad geometry value (such as area and/or volume) with respect to blind via geometry value (such as area and/or volume) and at least one appearance value for a plurality of captured pad areas with laser formed blind via located in the imaged capture pad areas. [0022] While lhe invention has been described in connection with what is presently considered to be the most practical and preferred embodiment, it is to be understood that the invention is not to be limited to the disclosed embodiments but, on the contrary, is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the appended claims, which scope is to be accorded the broadest interpretation so as to encompass all such modifications and equivalent structures as is permitted under the law.

Claims

What is claimed is:
1. A process for laser forming a blind via in at least one layer of a circuit substrate having a plurality of capture pads of varying geometry comprising: for at least one blind via to be formed in at least one layer of a circuit substrate, evaluating a capture pad geometry value within a predetermined distance from a drilling location with respect to a blind via geometry value to be formed at the drilling location; and setting at least one laser operating parameter based on a result of the evaluation in order to obtain a desired capture pad appearance after blind via formation.
2. The process of claim 1 further comprising: analyzing a capture pad appearance after blind via formation.
3. The process of claim 2, wherein analyzing a capture pad appearance after blind via formation further comprises: imaging a capture pad area defined as an area within a predetermined distance from a blind via drilling location in at least one layer of a circuit substrate; quantifying an appearance value for the imaged capture pad area; and determining acceptability of the imaged capture pad area based on the quantified appearance value.
4. The process of claim 2, wherein setting at least one laser parameter further comprises: adjusting at least one laser process parameter based on feedback from a relationship between the ratio of capture pad geometry value to blind via geometry value corresponding to an analyzed capture pad appearance for a plurality of capture pad areas with laser-formed blind via located in the plurality of capture pad areas.
5. A process for laser forming a blind via in at least one layer of a circuit substrate having a plurality of capture pads of varying geometry comprising: imaging a capture pad area defined as an area within a predetermined distance from a blind via drilling location in at least one layer of a circuit substrate; quantifying an appearance value for the imaged capture pad area ; and determining acceptability of the imaged capture pad area based on the quantified appearance value.
6. The process of claim 5, wherein imaging the capture pad area further comprises: imaging a capture pad area with a laser-formed blind via located in the capture pad area.
7. The process of claim 5 further comprising: optimizing at least one laser process parameter based on a relationship between a ratio of capture pad geometry value to blind via geometry value with respect to the appearance value for a plurality of imaged capture pad areas with a laser-formed blind via located in the imaged capture pad area.
8. The process of claim 5 further comprising: for at least one blind via to be formed in at least one layer of a circuit substrate, evaluating a capture pad geometry value within a predetermined distance from a drilling location with respect to a blind via geometry value to be formed at the drilling location.
9. The process of claim 8 further comprising: setting at least one laser operating parameter based on results of the evaluation in order to obtain a desired capture pad appearance after blind via formation.
10. The process of claim 5 further comprising: setting at least one laser operating parameter based on the quantified appearance value in order to obtain a desired capture pad appearance after blind via formation.
11. The process of claim 1 or 7, wherein the at least one laser process parameter to be set is selected from a group consisting of laser fluence, number of laser pulses, laser pulse width, and any combination thereof.
12. The process of claim 1 or 7 further comprising: comparing a given drill layer to an adjacent drill layer to determine if blind vias are stacked from layer to layer.
13. The process of claim 1 or 5 further comprising: defining a drill layer; defining a scan area adjacent a drill location in the defined drill layer; defining a set of ratio ranges, wherein the ratio is defined as the capture pad geometry value within the predetermined distance from the drilling location to the blind via geometry value to be formed at the drilling location; and selecting a destination layer for drill tools corresponding to each set ratio range.
14. The process of claim 3 or 5, wherein quantifying the appearance value further comprises; quantifying a numeric appearance value for the imaged capture pad area to minimize subjectivity in a quality judgment of a laser- formed blind via in the imaged capture pad area.
15. The process of claim 3 or 5, wherein quantifying the appearance value further comprises; performing a fractal dimension analysis on the imaged capture pad area to obtain a numerical value for fractal dimension, where a higher value corresponds to a subjective "matt" surface texture and a lower value corresponds to a subjective "shiny" surface texture for the imaged capture pad area.
16. The process of claim 3 or 5, wherein quantifying the appearance value further comprises: performing a histogram analysis on the imaged capture pad area to obtain a numerical value for symmetry between populations in the histogram, wherein a value approximating unity corresponds to a subjective "matt" surface texture, a value smaller than unity corresponds to a subjective "shiny" surface texture, and a value greater than unity corresponds to a subjective "dark" surface texture.
17. The process of claim 3 or 5, wherein quantifying the appearance value further comprises: performing a histogram analysis and a fractal dimension analysis on the imaged capture pad area to quantify a numeric appearance value for the imaged capture pad area.
18. The process of claim 3 or 5, wherein determining acceptability of the imaged capture pad area based on the quantified appearance value further comprises: analyzing a relationship between the ratio of capture pad geometry value to blind via geometry value with respect to the quantified appearance value for a plurality of imaged capture pad areas to minimize variance in quality of formed blind via over an entire circuit pattern.
19. The process of claim 18 further comprising: adjusting at least one laser process parameter based on feedback from the relationship between the ratio of capture pad geometry value to blind via geometry value corresponding to the quantified appearance value for a plurality of imaged capture pad areas with a laser-formed blind via located in the imaged capture pad area.
20. The process of claim 1 or 8, wherein evaluating a capture pad geometry value within a predetermined distance from a drilling location with respect to a blind via geometry value to be formed at the drilling location for at least one blind via to be formed in at least one layer of a circuit substrate further comprises: calculating a ratio of the capture pad geometry value within the predetermined distance from the drilling location with respect to the blind via geometry value to be formed at the drilling location for each blind via to be formed in at least one layer of the circuit substrate.
PCT/US2007/073103 2006-07-11 2007-07-10 Process and system for quality management and analysis of via drilling WO2008011296A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DE112007001549T DE112007001549T5 (en) 2006-07-11 2007-07-10 Method and system for quality management and analysis of through-hole drilling
JP2009519620A JP5330991B2 (en) 2006-07-11 2007-07-10 Method and system for quality control and analysis of via drilling
GB0900113A GB2453286A (en) 2006-07-11 2007-07-10 Process and system for quality management and analysis of via drilling
CN2007800258810A CN101490826B (en) 2006-07-11 2007-07-10 Process and system for quality management and analysis of via drilling

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/484,531 US7544304B2 (en) 2006-07-11 2006-07-11 Process and system for quality management and analysis of via drilling
US11/484,531 2006-07-11

Publications (2)

Publication Number Publication Date
WO2008011296A2 true WO2008011296A2 (en) 2008-01-24
WO2008011296A3 WO2008011296A3 (en) 2008-04-24

Family

ID=38948195

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2007/073103 WO2008011296A2 (en) 2006-07-11 2007-07-10 Process and system for quality management and analysis of via drilling

Country Status (9)

Country Link
US (2) US7544304B2 (en)
JP (2) JP5330991B2 (en)
KR (1) KR101475530B1 (en)
CN (2) CN103358031B (en)
DE (1) DE112007001549T5 (en)
GB (1) GB2453286A (en)
SG (1) SG173323A1 (en)
TW (1) TWI409007B (en)
WO (1) WO2008011296A2 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7544304B2 (en) * 2006-07-11 2009-06-09 Electro Scientific Industries, Inc. Process and system for quality management and analysis of via drilling
US7962232B2 (en) * 2006-10-01 2011-06-14 Dell Products L.P. Methods and media for processing a circuit board
FR2957481B1 (en) * 2010-03-10 2012-08-31 Commissariat Energie Atomique INTERCONNECTION STRUCTURE COMPRISING VIAS BORGNES FOR METALLIZATION
CN103245312A (en) * 2012-02-10 2013-08-14 文坦自动化有限公司 Analysis method of drill hole quality
US9629313B1 (en) * 2013-01-29 2017-04-25 Victor A. Grossman System for growing plants and method of operation thereof
CN103714203B (en) * 2013-12-20 2016-08-03 柳州腾龙煤电科技股份有限公司 Log sheet automatic mapping method based on CAD template binding technology
CN111610740B (en) * 2020-06-03 2021-07-02 上海柏楚数控科技有限公司 Processing control method and system, first and second control devices, and storage medium

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5879787A (en) * 1996-11-08 1999-03-09 W. L. Gore & Associates, Inc. Method and apparatus for improving wireability in chip modules
US20020021138A1 (en) * 1996-11-08 2002-02-21 John J. Budnaitis Method of wafer level burn-in
US20040146917A1 (en) * 2001-08-03 2004-07-29 Nanosphere, Inc. Nanoparticle imaging system and method
US20040258310A1 (en) * 2003-02-14 2004-12-23 The University Of Chicago Method and system for fractal-based analysis of medical image texture
US20050169514A1 (en) * 1999-05-04 2005-08-04 Speedline Technologies, Inc. Systems and methods for detecting defects in printed solder paste
US20060037192A1 (en) * 2004-08-17 2006-02-23 Nokia Corporation Printed wiring board without traces on surface layers enabling PWB's without solder resist

Family Cites Families (53)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5227614A (en) 1986-08-15 1993-07-13 Norand Corporation Core computer processor module, and peripheral shell module assembled to form a pocket size data capture unit
US5293026A (en) * 1991-01-28 1994-03-08 Eaton Corporation Hardsurfacing material for engine components and method for depositing same
US5293025A (en) 1991-08-01 1994-03-08 E. I. Du Pont De Nemours And Company Method for forming vias in multilayer circuits
US5243140A (en) 1991-10-04 1993-09-07 International Business Machines Corporation Direct distribution repair and engineering change system
AU5538494A (en) 1992-10-30 1994-05-24 Microbilt Corporation Multi-reader transaction terminal
US5561282A (en) 1993-04-30 1996-10-01 Microbilt Corporation Portable signature capture pad
US5448044A (en) 1993-04-30 1995-09-05 Microbilt Corporation Signature capture pad for point of sale system
US5686790A (en) 1993-06-22 1997-11-11 Candescent Technologies Corporation Flat panel device with ceramic backplate
US5464682A (en) * 1993-12-14 1995-11-07 International Business Machines Corporation Minimal capture pads applied to ceramic vias in ceramic substrates
US5518964A (en) 1994-07-07 1996-05-21 Tessera, Inc. Microelectronic mounting with multiple lead deformation and bonding
US5830782A (en) 1994-07-07 1998-11-03 Tessera, Inc. Microelectronic element bonding with deformation of leads in rows
US5614114A (en) 1994-07-18 1997-03-25 Electro Scientific Industries, Inc. Laser system and method for plating vias
ES2124023T3 (en) 1994-10-14 1999-01-16 United Parcel Service Inc MULTI-PHASE PACKAGE TRACKING SYSTEM.
EP1489550B1 (en) 1994-10-25 2011-07-20 United Parcel Service Of America, Inc. Automatic electronic camera for label image capture
US5813331A (en) 1995-09-22 1998-09-29 Motorola, Inc. Method of printing with a differential thickness stencil
US5724889A (en) 1995-09-22 1998-03-10 Motorola, Inc. Stencil shifter
US5699613A (en) 1995-09-25 1997-12-23 International Business Machines Corporation Fine dimension stacked vias for a multiple layer circuit board structure
US5757079A (en) 1995-12-21 1998-05-26 International Business Machines Corporation Method for repairing defective electrical connections on multi-layer thin film (MLTF) electronic packages and the resulting MLTF structure
US6631558B2 (en) 1996-06-05 2003-10-14 Laservia Corporation Blind via laser drilling system
WO1997046349A1 (en) 1996-06-05 1997-12-11 Burgess Larry W Blind via laser drilling system
US5787578A (en) 1996-07-09 1998-08-04 International Business Machines Corporation Method of selectively depositing a metallic layer on a ceramic substrate
GB9620229D0 (en) 1996-09-27 1996-11-13 Graphers Systems Ltd Apparatus for measuring the quality of spot welds
US6541709B1 (en) 1996-11-01 2003-04-01 International Business Machines Corporation Inherently robust repair process for thin film circuitry using uv laser
WO1998020557A1 (en) 1996-11-08 1998-05-14 W.L. Gore & Associates, Inc. Method for reducing via inductance in an electronic assembly and device
US7301748B2 (en) 1997-04-08 2007-11-27 Anthony Anthony A Universal energy conditioning interposer with circuit architecture
US7110227B2 (en) 1997-04-08 2006-09-19 X2Y Attenuators, Llc Universial energy conditioning interposer with circuit architecture
JP3488614B2 (en) * 1998-01-09 2004-01-19 三菱電機株式会社 Laminate material recess inspection device and laser processing device
CA2252298A1 (en) * 1998-03-31 1999-09-30 Molly S. Shoichet New fluoromonomers and methods of production, and new fluoropolymers produced therefrom
GB9811328D0 (en) 1998-05-27 1998-07-22 Exitech Ltd The use of mid-infrared lasers for drilling microvia holes in printed circuit (wiring) boards and other electrical circuit interconnection packages
WO2000009993A1 (en) 1998-08-10 2000-02-24 Mitsubishi Denki Kabushiki Kaisha Device for inspecting printed boards
US6400018B2 (en) 1998-08-27 2002-06-04 3M Innovative Properties Company Via plug adapter
GB9901586D0 (en) * 1999-01-25 1999-03-17 Alpha Fry Ltd Process for the recovery of lead and/or tin or alloys thereof from substrate surfaces
US6444616B1 (en) * 1999-02-02 2002-09-03 Bayer Aktiengesellschaft Substituted p-trifluoromethylphenyluracils
US6235544B1 (en) 1999-04-20 2001-05-22 International Business Machines Corporation Seed metal delete process for thin film repair solutions using direct UV laser
US6534743B2 (en) 2001-02-01 2003-03-18 Electro Scientific Industries, Inc. Resistor trimming with small uniform spot from solid-state UV laser
US6753612B2 (en) 2001-04-05 2004-06-22 International Business Machines Corporation Economical high density chip carrier
US20030066679A1 (en) 2001-10-09 2003-04-10 Castro Abram M. Electrical circuit and method of formation
US6541712B1 (en) 2001-12-04 2003-04-01 Teradyhe, Inc. High speed multi-layer printed circuit board via
TW558823B (en) 2002-04-10 2003-10-21 Via Tech Inc Through-hole process of integrated circuit substrate
US20040112881A1 (en) 2002-04-11 2004-06-17 Bloemeke Stephen Roger Circle laser trepanning
TWI271131B (en) 2002-04-23 2007-01-11 Via Tech Inc Pattern fabrication process of circuit substrate
TW561803B (en) 2002-10-24 2003-11-11 Advanced Semiconductor Eng Circuit substrate and manufacturing method thereof
TW587322B (en) 2002-12-31 2004-05-11 Phoenix Prec Technology Corp Substrate with stacked via and fine circuit thereon, and method for fabricating the same
US6867121B2 (en) 2003-01-16 2005-03-15 International Business Machines Corporation Method of apparatus for interconnecting a relatively fine pitch circuit layer and adjacent power plane(s) in a laminated construction
US7402758B2 (en) 2003-10-09 2008-07-22 Qualcomm Incorporated Telescoping blind via in three-layer core
US7018219B2 (en) 2004-02-25 2006-03-28 Rosenau Steven A Interconnect structure and method for connecting buried signal lines to electrical devices
US20050190959A1 (en) * 2004-02-26 2005-09-01 Kohler James P. Drill hole inspection method for printed circuit board fabrication
US20050189656A1 (en) 2004-02-26 2005-09-01 Chun Yee Tan Micro-vias for electronic packaging
US7755445B2 (en) * 2004-08-03 2010-07-13 Banpil Photonics, Inc. Multi-layered high-speed printed circuit boards comprised of stacked dielectric systems
US20060091023A1 (en) 2004-10-28 2006-05-04 Ahsan Bukhari Assessing micro-via formation PCB substrate manufacturing process
US7544304B2 (en) * 2006-07-11 2009-06-09 Electro Scientific Industries, Inc. Process and system for quality management and analysis of via drilling
US7817685B2 (en) 2007-01-26 2010-10-19 Electro Scientific Industries, Inc. Methods and systems for generating pulse trains for material processing
US9029731B2 (en) 2007-01-26 2015-05-12 Electro Scientific Industries, Inc. Methods and systems for laser processing continuously moving sheet material

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5879787A (en) * 1996-11-08 1999-03-09 W. L. Gore & Associates, Inc. Method and apparatus for improving wireability in chip modules
US20020021138A1 (en) * 1996-11-08 2002-02-21 John J. Budnaitis Method of wafer level burn-in
US20050169514A1 (en) * 1999-05-04 2005-08-04 Speedline Technologies, Inc. Systems and methods for detecting defects in printed solder paste
US20040146917A1 (en) * 2001-08-03 2004-07-29 Nanosphere, Inc. Nanoparticle imaging system and method
US20040258310A1 (en) * 2003-02-14 2004-12-23 The University Of Chicago Method and system for fractal-based analysis of medical image texture
US20060037192A1 (en) * 2004-08-17 2006-02-23 Nokia Corporation Printed wiring board without traces on surface layers enabling PWB's without solder resist

Also Published As

Publication number Publication date
KR20090033383A (en) 2009-04-02
JP2009544154A (en) 2009-12-10
CN101490826B (en) 2013-08-21
JP2013225707A (en) 2013-10-31
US7544304B2 (en) 2009-06-09
CN103358031A (en) 2013-10-23
CN101490826A (en) 2009-07-22
CN103358031B (en) 2016-07-06
US20090179017A1 (en) 2009-07-16
US8501021B2 (en) 2013-08-06
JP5330991B2 (en) 2013-10-30
TW200814876A (en) 2008-03-16
US20080011715A1 (en) 2008-01-17
GB0900113D0 (en) 2009-02-11
SG173323A1 (en) 2011-08-29
WO2008011296A3 (en) 2008-04-24
TWI409007B (en) 2013-09-11
KR101475530B1 (en) 2014-12-22
GB2453286A (en) 2009-04-01
DE112007001549T5 (en) 2009-05-20
JP5735589B2 (en) 2015-06-17

Similar Documents

Publication Publication Date Title
US8501021B2 (en) Process and system for quality management and analysis of via drilling
US20050062583A1 (en) Drift-sensitive laser trimming of circuit elements
CN104427774B (en) Changing printing control parameters based on measuring solder paste deposits in specific sub-areas of a PCB
Huang Reducing solder paste inspection in surface-mount assembly through Mahalanobis–Taguchi analysis
Yang et al. A neural network-based prediction model for fine pitch stencil-printing quality in surface mount assembly
US7630536B2 (en) Printing inspection apparatus, printing inspection method, printing inspection data generating apparatus, and printing inspection data generating method
US6940038B2 (en) Laser trimming of resistors
JP2009544154A5 (en)
US7329831B2 (en) Laser trimming of resistors
TWI778606B (en) Machining station and method for machining workpieces
US7297896B2 (en) Laser trimming of resistors
TWI806185B (en) Test target defect identification and evaluation for assessing quality of component carrier structure
JP2001244601A (en) Printed circuit board manufacturing system
EP2020832A2 (en) Product optimization process for embedded passives
JP2007048957A (en) Quality inspection method of printed board, method of selecting master board for inspecting printed board, and method of manufacturing printed board using either of them; and quality inspection system of printed board, system of selecting master board for inspecting printed circuit board, and system of manufacturing printed board comprising either of them
GIACHETTI Models to estimate printed circuit board fabrication yield during the design stage
CN114173492A (en) Through blind hole design method for detecting hole filling capacity of circuit board
CN115249232A (en) Inspection system
Shina et al. A Method for Selecting Electronic Manufacturing Processes Based on Cost Factors
Huang et al. Materials Assessment and Process Characterization for Lead-Free Soldering
Boyle Process Integration for Multi-Chip Module Design
Bhuvanesh et al. Defect Classification for Leadframe Manufacturing Using Artificial Neural Networks

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 200780025881.0

Country of ref document: CN

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 07840374

Country of ref document: EP

Kind code of ref document: A2

ENP Entry into the national phase

Ref document number: 0900113

Country of ref document: GB

Kind code of ref document: A

Free format text: PCT FILING DATE = 20070710

WWE Wipo information: entry into national phase

Ref document number: 0900113.2

Country of ref document: GB

WWE Wipo information: entry into national phase

Ref document number: 2009519620

Country of ref document: JP

WWE Wipo information: entry into national phase

Ref document number: 1120070015497

Country of ref document: DE

WWE Wipo information: entry into national phase

Ref document number: 1020097002627

Country of ref document: KR

NENP Non-entry into the national phase

Ref country code: RU

RET De translation (de og part 6b)

Ref document number: 112007001549

Country of ref document: DE

Date of ref document: 20090520

Kind code of ref document: P

122 Ep: pct application non-entry in european phase

Ref document number: 07840374

Country of ref document: EP

Kind code of ref document: A2