WO2008017005A3 - Sloping electrodes in a spatial light modulator - Google Patents
Sloping electrodes in a spatial light modulator Download PDFInfo
- Publication number
- WO2008017005A3 WO2008017005A3 PCT/US2007/075017 US2007075017W WO2008017005A3 WO 2008017005 A3 WO2008017005 A3 WO 2008017005A3 US 2007075017 W US2007075017 W US 2007075017W WO 2008017005 A3 WO2008017005 A3 WO 2008017005A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- micromirror
- electrode
- light modulator
- spatial light
- substrate
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
- G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
Abstract
A method of tilting a micromirror (218) includes forming a substrate (202), a micromirror outwardly from the substrate, and at least one electrode (212a) inwardly from the micromirror. The method further includes applying, by the at least one electrode, electrostatic forces sufficient to pivot the micromirror about a pivot point. In addition, the method includes providing the at least one electrode with a sloped outer surface (210a). The sloped outer surface has a first end and a second end. The second end is closer to the pivot point than the first end, and the first end is closer to the substrate than the second end. The method also includes providing at least a portion of the at least one electrode with material properties that at least partially contribute to the sloped profile of the sloped outer surface.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/498,910 US7365898B2 (en) | 2006-08-02 | 2006-08-02 | Sloping electrodes in a spatial light modulator |
US11/498,910 | 2006-08-02 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2008017005A2 WO2008017005A2 (en) | 2008-02-07 |
WO2008017005A3 true WO2008017005A3 (en) | 2009-01-15 |
Family
ID=38997853
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2007/075017 WO2008017005A2 (en) | 2006-08-02 | 2007-08-02 | Sloping electrodes in a spatial light modulator |
Country Status (2)
Country | Link |
---|---|
US (1) | US7365898B2 (en) |
WO (1) | WO2008017005A2 (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7466476B2 (en) * | 2006-08-02 | 2008-12-16 | Texas Instruments Incorporated | Sloped cantilever beam electrode for a MEMS device |
US20090243011A1 (en) | 2008-03-26 | 2009-10-01 | Texas Instruments Incorporated | Manufacturing Optical MEMS with Thin-Film Anti-Reflective Layers |
DE102013203035A1 (en) * | 2013-02-25 | 2014-08-28 | Carl Zeiss Smt Gmbh | OPTICAL MODULE |
US9348136B2 (en) * | 2013-05-14 | 2016-05-24 | Texas Instruments Incorporated | Micromirror apparatus and methods |
US9864188B2 (en) | 2014-11-03 | 2018-01-09 | Texas Instruments Incorporated | Operation/margin enhancement feature for surface-MEMS structure; sculpting raised address electrode |
US9448484B2 (en) | 2014-11-03 | 2016-09-20 | Texas Instruments Incorporated | Sloped electrode element for a torsional spatial light modulator |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6351330B2 (en) * | 1998-04-10 | 2002-02-26 | Samsung Electronics Co., Ltd. | Micromirror device for image display apparatus |
US20020041455A1 (en) * | 2000-10-10 | 2002-04-11 | Nippon Telegraph And Telephone Corporation | Micro-mirror apparatus and production method therefor |
US20050117196A1 (en) * | 2003-09-22 | 2005-06-02 | Fuji Photo Film Co., Ltd. | Spatial light modulator, spatial light modulator array, and exposure apparatus |
US7027206B2 (en) * | 2004-01-26 | 2006-04-11 | Fuji Photo Film Co., Ltd. | Spatial light modulator, spatial light modulator array, and image formation apparatus |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19604242C2 (en) | 1996-02-06 | 1999-09-02 | Fraunhofer Ges Forschung | Manufacturing method for three-dimensionally shaped metal profiles and application of the method for manufacturing metal profiles for micromechanics |
US6552840B2 (en) | 1999-12-03 | 2003-04-22 | Texas Instruments Incorporated | Electrostatic efficiency of micromechanical devices |
US6825967B1 (en) | 2000-09-29 | 2004-11-30 | Calient Networks, Inc. | Shaped electrodes for micro-electro-mechanical-system (MEMS) devices to improve actuator performance and methods for fabricating the same |
KR100413793B1 (en) * | 2000-12-05 | 2003-12-31 | 삼성전자주식회사 | Micromirror actuator |
US6487001B2 (en) | 2000-12-13 | 2002-11-26 | Agere Systems Inc. | Article comprising wedge-shaped electrodes |
KR100403812B1 (en) * | 2001-06-23 | 2003-10-30 | 삼성전자주식회사 | Micro actuator |
US6798560B2 (en) * | 2002-10-11 | 2004-09-28 | Exajoula, Llc | Micromirror systems with open support structures |
US6825968B2 (en) | 2002-10-11 | 2004-11-30 | Exajoule, Llc | Micromirror systems with electrodes configured for sequential mirror attraction |
-
2006
- 2006-08-02 US US11/498,910 patent/US7365898B2/en active Active
-
2007
- 2007-08-02 WO PCT/US2007/075017 patent/WO2008017005A2/en active Application Filing
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6351330B2 (en) * | 1998-04-10 | 2002-02-26 | Samsung Electronics Co., Ltd. | Micromirror device for image display apparatus |
US20020041455A1 (en) * | 2000-10-10 | 2002-04-11 | Nippon Telegraph And Telephone Corporation | Micro-mirror apparatus and production method therefor |
US20050117196A1 (en) * | 2003-09-22 | 2005-06-02 | Fuji Photo Film Co., Ltd. | Spatial light modulator, spatial light modulator array, and exposure apparatus |
US7027206B2 (en) * | 2004-01-26 | 2006-04-11 | Fuji Photo Film Co., Ltd. | Spatial light modulator, spatial light modulator array, and image formation apparatus |
Also Published As
Publication number | Publication date |
---|---|
US20080030841A1 (en) | 2008-02-07 |
WO2008017005A2 (en) | 2008-02-07 |
US7365898B2 (en) | 2008-04-29 |
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