WO2008042579A3 - Targeted data collection architecture - Google Patents

Targeted data collection architecture Download PDF

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Publication number
WO2008042579A3
WO2008042579A3 PCT/US2007/078575 US2007078575W WO2008042579A3 WO 2008042579 A3 WO2008042579 A3 WO 2008042579A3 US 2007078575 W US2007078575 W US 2007078575W WO 2008042579 A3 WO2008042579 A3 WO 2008042579A3
Authority
WO
WIPO (PCT)
Prior art keywords
data collection
sensor
sensors
plasma processing
collection host
Prior art date
Application number
PCT/US2007/078575
Other languages
French (fr)
Other versions
WO2008042579A2 (en
Inventor
Chung-Ho Huang
Shih-Jeun Fan
Original Assignee
Lam Res Corp
Chung-Ho Huang
Shih-Jeun Fan
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Res Corp, Chung-Ho Huang, Shih-Jeun Fan filed Critical Lam Res Corp
Priority to CN2007800363785A priority Critical patent/CN101535980B/en
Priority to JP2009530519A priority patent/JP5193211B2/en
Priority to KR1020097006377A priority patent/KR101433401B1/en
Publication of WO2008042579A2 publication Critical patent/WO2008042579A2/en
Publication of WO2008042579A3 publication Critical patent/WO2008042579A3/en

Links

Classifications

    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B23/00Testing or monitoring of control systems or parts thereof
    • G05B23/02Electric testing or monitoring
    • G05B23/0205Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults
    • G05B23/0218Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults characterised by the fault detection method dealing with either existing or incipient faults
    • G05B23/0221Preprocessing measurements, e.g. data collection rate adjustment; Standardization of measurements; Time series or signal analysis, e.g. frequency analysis or wavelets; Trustworthiness of measurements; Indexes therefor; Measurements using easily measured parameters to estimate parameters difficult to measure; Virtual sensor creation; De-noising; Sensor fusion; Unconventional preprocessing inherently present in specific fault detection methods like PCA-based methods
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F15/00Digital computers in general; Data processing equipment in general
    • G06F15/16Combinations of two or more digital computers each having at least an arithmetic unit, a program unit and a register, e.g. for a simultaneous processing of several programs
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F15/00Digital computers in general; Data processing equipment in general
    • G06F15/16Combinations of two or more digital computers each having at least an arithmetic unit, a program unit and a register, e.g. for a simultaneous processing of several programs
    • G06F15/163Interprocessor communication
    • G06F15/173Interprocessor communication using an interconnection network, e.g. matrix, shuffle, pyramid, star, snowflake
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F9/00Arrangements for program control, e.g. control units
    • G06F9/06Arrangements for program control, e.g. control units using stored programs, i.e. using an internal store of processing equipment to receive or retain programs
    • G06F9/46Multiprogramming arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32917Plasma diagnostics
    • H01J37/32935Monitoring and controlling tubes by information coming from the object and/or discharge
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04LTRANSMISSION OF DIGITAL INFORMATION, e.g. TELEGRAPHIC COMMUNICATION
    • H04L67/00Network arrangements or protocols for supporting network services or applications
    • H04L67/01Protocols
    • H04L67/12Protocols specially adapted for proprietary or special-purpose networking environments, e.g. medical networks, sensor networks, networks in vehicles or remote metering networks

Abstract

A targeted data collection system configured to collect processing data in a plasma processing system is provided. The system includes a data collection host and a plurality of plasma processing components having a plurality of sensors such that each of the plurality of plasma processing components having at least one sensor. Each of the sensors implements at least one intelligent targeted data agent that governs sensor data collection behavior. The system further includes a communication network coupling data collection host and plurality of sensors for bi-directional communication such that a given sensor of plurality of sensors receive information from data collection host pertaining to plasma processing system conditions occurring elsewhere from given sensor. Information received from data collection host causes the given processor to collect sensor in a first manner different from a second manner employed by sensor prior to receiving e information from the data collection host.
PCT/US2007/078575 2006-09-28 2007-09-14 Targeted data collection architecture WO2008042579A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
CN2007800363785A CN101535980B (en) 2006-09-28 2007-09-14 Targeted data collection architecture
JP2009530519A JP5193211B2 (en) 2006-09-28 2007-09-14 Targeted data collection structure
KR1020097006377A KR101433401B1 (en) 2006-09-28 2007-09-14 Targeted data collection architecture

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/536,585 US7565220B2 (en) 2006-09-28 2006-09-28 Targeted data collection architecture
US11/536,585 2006-09-28

Publications (2)

Publication Number Publication Date
WO2008042579A2 WO2008042579A2 (en) 2008-04-10
WO2008042579A3 true WO2008042579A3 (en) 2009-06-11

Family

ID=39262293

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2007/078575 WO2008042579A2 (en) 2006-09-28 2007-09-14 Targeted data collection architecture

Country Status (6)

Country Link
US (1) US7565220B2 (en)
JP (1) JP5193211B2 (en)
KR (1) KR101433401B1 (en)
CN (1) CN101535980B (en)
TW (1) TWI439927B (en)
WO (1) WO2008042579A2 (en)

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US8983631B2 (en) * 2009-06-30 2015-03-17 Lam Research Corporation Arrangement for identifying uncontrolled events at the process module level and methods thereof
US8271121B2 (en) * 2009-06-30 2012-09-18 Lam Research Corporation Methods and arrangements for in-situ process monitoring and control for plasma processing tools
US8618807B2 (en) * 2009-06-30 2013-12-31 Lam Research Corporation Arrangement for identifying uncontrolled events at the process module level and methods thereof
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Also Published As

Publication number Publication date
KR20090071575A (en) 2009-07-01
TWI439927B (en) 2014-06-01
US7565220B2 (en) 2009-07-21
CN101535980B (en) 2013-04-10
TW200832217A (en) 2008-08-01
JP5193211B2 (en) 2013-05-08
KR101433401B1 (en) 2014-08-26
WO2008042579A2 (en) 2008-04-10
CN101535980A (en) 2009-09-16
US20080082653A1 (en) 2008-04-03
JP2010505199A (en) 2010-02-18

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