WO2008057996A3 - Printability verification by progressive modeling accuracy - Google Patents

Printability verification by progressive modeling accuracy Download PDF

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Publication number
WO2008057996A3
WO2008057996A3 PCT/US2007/083441 US2007083441W WO2008057996A3 WO 2008057996 A3 WO2008057996 A3 WO 2008057996A3 US 2007083441 W US2007083441 W US 2007083441W WO 2008057996 A3 WO2008057996 A3 WO 2008057996A3
Authority
WO
WIPO (PCT)
Prior art keywords
errors
models
optical
progressively
identified
Prior art date
Application number
PCT/US2007/083441
Other languages
French (fr)
Other versions
WO2008057996A2 (en
Inventor
Kafai Lai
Alan E Rosenbluth
Gregg M Gallatin
Maharaj Mukherjee
Original Assignee
Ibm
Kafai Lai
Alan E Rosenbluth
Gregg M Gallatin
Maharaj Mukherjee
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm, Kafai Lai, Alan E Rosenbluth, Gregg M Gallatin, Maharaj Mukherjee filed Critical Ibm
Priority to AT07844831T priority Critical patent/ATE519169T1/en
Priority to EP07844831A priority patent/EP2095280B1/en
Publication of WO2008057996A2 publication Critical patent/WO2008057996A2/en
Publication of WO2008057996A3 publication Critical patent/WO2008057996A3/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70433—Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/705—Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece

Abstract

A fast method of verifying a lithographic mask design is provided wherein catastrophic errors (432) are identified by iteratively simulating and verifying images for the mask layout using progressively more accurate image models (411), including optical and resist models. Progressively accurate optical models include SOCS kernels that provide successively less influence. Corresponding resist models are constructed that may include only SOCS kernel terms corresponding to the optical model, or may include image trait terms of varying influence ranges. Errors associated with excessive light, such as bridging, side- lobe or SRAF printing errors, are preferably identified with bright field simulations, while errors associated with insufficient light, such as necking or line-end shortening overlay errors, are preferably identified with dark field simulations.
PCT/US2007/083441 2006-11-02 2007-11-02 Printability verification by progressive modeling accuracy WO2008057996A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
AT07844831T ATE519169T1 (en) 2006-11-02 2007-11-02 PRINTABILITY VERIFICATION THROUGH STEP-BY-STEP MODELING ACCURACY
EP07844831A EP2095280B1 (en) 2006-11-02 2007-11-02 Printability verification by progressive modeling accuracy

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/555,854 US7512927B2 (en) 2006-11-02 2006-11-02 Printability verification by progressive modeling accuracy
US11/555,854 2006-11-02

Publications (2)

Publication Number Publication Date
WO2008057996A2 WO2008057996A2 (en) 2008-05-15
WO2008057996A3 true WO2008057996A3 (en) 2008-07-10

Family

ID=39365257

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2007/083441 WO2008057996A2 (en) 2006-11-02 2007-11-02 Printability verification by progressive modeling accuracy

Country Status (5)

Country Link
US (1) US7512927B2 (en)
EP (1) EP2095280B1 (en)
KR (1) KR20090085651A (en)
AT (1) ATE519169T1 (en)
WO (1) WO2008057996A2 (en)

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Also Published As

Publication number Publication date
EP2095280A4 (en) 2009-12-09
EP2095280A2 (en) 2009-09-02
WO2008057996A2 (en) 2008-05-15
US7512927B2 (en) 2009-03-31
US20080127027A1 (en) 2008-05-29
KR20090085651A (en) 2009-08-07
ATE519169T1 (en) 2011-08-15
EP2095280B1 (en) 2011-08-03

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