WO2008121547A2 - Ion acceleration column connection mechanism with integrated shielding electrode and related methods - Google Patents
Ion acceleration column connection mechanism with integrated shielding electrode and related methods Download PDFInfo
- Publication number
- WO2008121547A2 WO2008121547A2 PCT/US2008/057317 US2008057317W WO2008121547A2 WO 2008121547 A2 WO2008121547 A2 WO 2008121547A2 US 2008057317 W US2008057317 W US 2008057317W WO 2008121547 A2 WO2008121547 A2 WO 2008121547A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- accelerating device
- ion accelerating
- connector
- encapsulated
- connection system
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/248—Components associated with high voltage supply
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J5/00—Details relating to vessels or to leading-in conductors common to two or more basic types of discharge tubes or lamps
- H01J5/46—Leading-in conductors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R13/00—Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
- H01R13/46—Bases; Cases
- H01R13/53—Bases or cases for heavy duty; Bases or cases for high voltage with means for preventing corona or arcing
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2008800148533A CN101675493B (en) | 2007-03-29 | 2008-03-18 | Ion acceleration column connection mechanism with integral shielding electrode |
JP2010501079A JP5373761B2 (en) | 2007-03-29 | 2008-03-18 | Ion accelerating column connection mechanism with integral shielding electrode and method thereof |
KR1020097021443A KR101408671B1 (en) | 2007-03-29 | 2008-03-18 | Ion acceleration column connection mechanism with integrated shielding electrode and related methods |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/693,237 | 2007-03-29 | ||
US11/693,237 US7655928B2 (en) | 2007-03-29 | 2007-03-29 | Ion acceleration column connection mechanism with integrated shielding electrode and related methods |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2008121547A2 true WO2008121547A2 (en) | 2008-10-09 |
WO2008121547A3 WO2008121547A3 (en) | 2009-04-16 |
Family
ID=39722004
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2008/057317 WO2008121547A2 (en) | 2007-03-29 | 2008-03-18 | Ion acceleration column connection mechanism with integrated shielding electrode and related methods |
Country Status (6)
Country | Link |
---|---|
US (1) | US7655928B2 (en) |
JP (1) | JP5373761B2 (en) |
KR (1) | KR101408671B1 (en) |
CN (1) | CN101675493B (en) |
TW (1) | TWI437606B (en) |
WO (1) | WO2008121547A2 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7655928B2 (en) * | 2007-03-29 | 2010-02-02 | Varian Semiconductor Equipment Associates, Inc. | Ion acceleration column connection mechanism with integrated shielding electrode and related methods |
US7767986B2 (en) * | 2008-06-20 | 2010-08-03 | Varian Semiconductor Equipment Associates, Inc. | Method and apparatus for controlling beam current uniformity in an ion implanter |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1610903A (en) * | 1920-01-03 | 1926-12-14 | Gen Electric | Insulated terminal for electrical apparatus |
US3277423A (en) * | 1963-05-01 | 1966-10-04 | Raytheon Co | High-voltage electrical connector |
DE8502491U1 (en) * | 1985-01-31 | 1986-07-17 | Karl Pfisterer Elektrotechnische Spezialartikel Gmbh & Co Kg, 7000 Stuttgart | sleeve |
DE3611462A1 (en) * | 1986-04-05 | 1987-10-15 | Pfisterer Elektrotech Karl | Connecting fitting for conductors of a medium-voltage or high-voltage network |
US5597322A (en) * | 1993-05-26 | 1997-01-28 | Yazaki Corporation | Electro-magnetically shielded connector |
US20030127606A1 (en) * | 2001-12-10 | 2003-07-10 | Nissin Electric Co., Ltd. | Ion implanting apparatus and ion implanting method |
WO2006076359A1 (en) * | 2005-01-14 | 2006-07-20 | Cooper Technologies Company | Electrical connector assembly |
Family Cites Families (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4226897A (en) * | 1977-12-05 | 1980-10-07 | Plasma Physics Corporation | Method of forming semiconducting materials and barriers |
US4231766A (en) * | 1978-12-11 | 1980-11-04 | United Air Specialists, Inc. | Two stage electrostatic precipitator with electric field induced airflow |
US4222625A (en) * | 1978-12-28 | 1980-09-16 | Amerace Corporation | High voltage electrical connector shield construction |
JPS60132661A (en) * | 1983-12-20 | 1985-07-15 | Nippon Soken Inc | Air purifier |
AU595179B2 (en) * | 1985-06-06 | 1990-03-29 | Astra-Vent A.B. | Ion-wind air transporting arrangement |
US4789801A (en) * | 1986-03-06 | 1988-12-06 | Zenion Industries, Inc. | Electrokinetic transducing methods and apparatus and systems comprising or utilizing the same |
SE456204B (en) * | 1987-02-05 | 1988-09-12 | Astra Vent Ab | DEVICE FOR TRANSPORTATION OF AIR WITH THE USE OF ELECTRIC ION WIND |
US5134299A (en) * | 1991-03-13 | 1992-07-28 | Eaton Corporation | Ion beam implantation method and apparatus for particulate control |
JPH05225845A (en) * | 1992-02-17 | 1993-09-03 | Mitsubishi Electric Corp | Bushing for electric apparatus |
US5378899A (en) * | 1993-10-07 | 1995-01-03 | Kimber; Eugene L. | Ion implantation target charge control system |
US5504341A (en) * | 1995-02-17 | 1996-04-02 | Zimec Consulting, Inc. | Producing RF electric fields suitable for accelerating atomic and molecular ions in an ion implantation system |
US5667564A (en) * | 1996-08-14 | 1997-09-16 | Wein Products, Inc. | Portable personal corona discharge device for destruction of airborne microbes and chemical toxins |
JPH10177846A (en) * | 1996-12-18 | 1998-06-30 | Sony Corp | Ion source of ion implantation device |
US5729028A (en) * | 1997-01-27 | 1998-03-17 | Rose; Peter H. | Ion accelerator for use in ion implanter |
US6176977B1 (en) * | 1998-11-05 | 2001-01-23 | Sharper Image Corporation | Electro-kinetic air transporter-conditioner |
US6515290B1 (en) * | 2000-09-05 | 2003-02-04 | Axcelis Technologies, Inc. | Bulk gas delivery system for ion implanters |
US6639227B1 (en) * | 2000-10-18 | 2003-10-28 | Applied Materials, Inc. | Apparatus and method for charged particle filtering and ion implantation |
JP4496402B2 (en) * | 2001-01-11 | 2010-07-07 | 三菱電機株式会社 | Gas insulation device and insulation spacer thereof |
US20030029563A1 (en) * | 2001-08-10 | 2003-02-13 | Applied Materials, Inc. | Corrosion resistant coating for semiconductor processing chamber |
US6664547B2 (en) * | 2002-05-01 | 2003-12-16 | Axcelis Technologies, Inc. | Ion source providing ribbon beam with controllable density profile |
US6664548B2 (en) * | 2002-05-01 | 2003-12-16 | Axcelis Technologies, Inc. | Ion source and coaxial inductive coupler for ion implantation system |
US6919698B2 (en) * | 2003-01-28 | 2005-07-19 | Kronos Advanced Technologies, Inc. | Electrostatic fluid accelerator for and method of controlling a fluid flow |
US6922463B2 (en) * | 2002-11-14 | 2005-07-26 | Ge Medical Systems Global Technology Company, Llc | Thermally high conductive HV connector for a mono-polar CT tube |
JP2004273360A (en) * | 2003-03-11 | 2004-09-30 | Hitachi Medical Corp | High voltage socket and x-ray tube device using the same |
FR2871812B1 (en) * | 2004-06-16 | 2008-09-05 | Ion Beam Services Sa | IONIC IMPLANTER OPERATING IN PLASMA PULSE MODE |
US7453069B2 (en) * | 2006-12-06 | 2008-11-18 | Varian Semiconductor Equipment Associates, Inc. | Bushing unit with integrated conductor in ion accelerating device and related method |
US7655928B2 (en) * | 2007-03-29 | 2010-02-02 | Varian Semiconductor Equipment Associates, Inc. | Ion acceleration column connection mechanism with integrated shielding electrode and related methods |
TW200908100A (en) * | 2007-08-07 | 2009-02-16 | Promos Technologies Inc | Mountable and dismountable inner shield |
US7863520B2 (en) * | 2007-08-14 | 2011-01-04 | Varian Semiconductor Equipment Associates, Inc. | Interfacing two insulation parts in high voltage environment |
US7915597B2 (en) * | 2008-03-18 | 2011-03-29 | Axcelis Technologies, Inc. | Extraction electrode system for high current ion implanter |
-
2007
- 2007-03-29 US US11/693,237 patent/US7655928B2/en active Active
-
2008
- 2008-03-18 WO PCT/US2008/057317 patent/WO2008121547A2/en active Application Filing
- 2008-03-18 CN CN2008800148533A patent/CN101675493B/en active Active
- 2008-03-18 KR KR1020097021443A patent/KR101408671B1/en active IP Right Grant
- 2008-03-18 JP JP2010501079A patent/JP5373761B2/en active Active
- 2008-03-25 TW TW097110536A patent/TWI437606B/en active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1610903A (en) * | 1920-01-03 | 1926-12-14 | Gen Electric | Insulated terminal for electrical apparatus |
US3277423A (en) * | 1963-05-01 | 1966-10-04 | Raytheon Co | High-voltage electrical connector |
DE8502491U1 (en) * | 1985-01-31 | 1986-07-17 | Karl Pfisterer Elektrotechnische Spezialartikel Gmbh & Co Kg, 7000 Stuttgart | sleeve |
DE3611462A1 (en) * | 1986-04-05 | 1987-10-15 | Pfisterer Elektrotech Karl | Connecting fitting for conductors of a medium-voltage or high-voltage network |
US5597322A (en) * | 1993-05-26 | 1997-01-28 | Yazaki Corporation | Electro-magnetically shielded connector |
US20030127606A1 (en) * | 2001-12-10 | 2003-07-10 | Nissin Electric Co., Ltd. | Ion implanting apparatus and ion implanting method |
WO2006076359A1 (en) * | 2005-01-14 | 2006-07-20 | Cooper Technologies Company | Electrical connector assembly |
Also Published As
Publication number | Publication date |
---|---|
TW200845085A (en) | 2008-11-16 |
TWI437606B (en) | 2014-05-11 |
US7655928B2 (en) | 2010-02-02 |
CN101675493A (en) | 2010-03-17 |
CN101675493B (en) | 2011-06-01 |
JP5373761B2 (en) | 2013-12-18 |
WO2008121547A3 (en) | 2009-04-16 |
JP2010522965A (en) | 2010-07-08 |
US20080238326A1 (en) | 2008-10-02 |
KR101408671B1 (en) | 2014-06-17 |
KR20100015569A (en) | 2010-02-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6797953B2 (en) | Electron beam system using multiple electron beams | |
US10699867B2 (en) | Simplified particle emitter and method of operating thereof | |
US6403972B1 (en) | Methods and apparatus for alignment of ion beam systems using beam current sensors | |
US11961697B2 (en) | Apparatus using charged particle beams | |
JP2022180431A (en) | Multi-beam inspection apparatus with improved signal electron detection performance | |
US20040149926A1 (en) | Emittance measuring device for ion beams | |
JP2023063390A (en) | Electromagnetic compound lens and charged particle optical system comprising such lens | |
US7655928B2 (en) | Ion acceleration column connection mechanism with integrated shielding electrode and related methods | |
KR100580749B1 (en) | Quartz insulator for ion implanter beamline components | |
US6593578B1 (en) | Wien filter for use in a scanning electron microscope or the like | |
JP2023541525A (en) | High voltage feedthroughs and connectors for charged particle devices | |
US7453069B2 (en) | Bushing unit with integrated conductor in ion accelerating device and related method | |
CA3203390A1 (en) | Electron lens | |
US6297512B1 (en) | Double shield for electron and ion beam columns | |
JP2022127284A (en) | Multipole Unit and Charged Particle Beam Device | |
JPH0448622Y2 (en) | ||
CN114188201A (en) | Electrode arrangement, contact assembly for an electrode arrangement, charged particle beam device and method of reducing the electric field strength in an electrode arrangement |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WWE | Wipo information: entry into national phase |
Ref document number: 200880014853.3 Country of ref document: CN |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 08743991 Country of ref document: EP Kind code of ref document: A2 |
|
ENP | Entry into the national phase |
Ref document number: 2010501079 Country of ref document: JP Kind code of ref document: A |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
ENP | Entry into the national phase |
Ref document number: 20097021443 Country of ref document: KR Kind code of ref document: A |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 08743991 Country of ref document: EP Kind code of ref document: A2 |