WO2009032448A3 - Zwitterionic block copolymers and methods - Google Patents
Zwitterionic block copolymers and methods Download PDFInfo
- Publication number
- WO2009032448A3 WO2009032448A3 PCT/US2008/071916 US2008071916W WO2009032448A3 WO 2009032448 A3 WO2009032448 A3 WO 2009032448A3 US 2008071916 W US2008071916 W US 2008071916W WO 2009032448 A3 WO2009032448 A3 WO 2009032448A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- block copolymers
- methods
- zwitterionic block
- zwitterionic
- disclosed
- Prior art date
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F293/00—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
- C08F293/005—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/141—Organic polymers or oligomers comprising aliphatic or olefinic chains, e.g. poly N-vinylcarbazol, PVC or PTFE
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/151—Copolymers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having a potential-jump barrier or a surface barrier
- H10K10/20—Organic diodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
- H10K71/441—Thermal treatment, e.g. annealing in the presence of a solvent vapour in the presence of solvent vapors, e.g. solvent vapour annealing
Abstract
Zwitterionic block copolymers having oppositely charged or chargeable terminal groups, and methods of making and using the same, are disclosed. The zwitterionic block copolymers can undergo microphase separation.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/897,593 | 2007-08-31 | ||
US11/897,593 US7732533B2 (en) | 2007-08-31 | 2007-08-31 | Zwitterionic block copolymers and methods |
Publications (2)
Publication Number | Publication Date |
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WO2009032448A2 WO2009032448A2 (en) | 2009-03-12 |
WO2009032448A3 true WO2009032448A3 (en) | 2009-08-06 |
Family
ID=40260486
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2008/071916 WO2009032448A2 (en) | 2007-08-31 | 2008-08-01 | Zwitterionic block copolymers and methods |
Country Status (3)
Country | Link |
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US (4) | US7732533B2 (en) |
TW (1) | TWI434868B (en) |
WO (1) | WO2009032448A2 (en) |
Families Citing this family (29)
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US8394483B2 (en) | 2007-01-24 | 2013-03-12 | Micron Technology, Inc. | Two-dimensional arrays of holes with sub-lithographic diameters formed by block copolymer self-assembly |
US8083953B2 (en) | 2007-03-06 | 2011-12-27 | Micron Technology, Inc. | Registered structure formation via the application of directed thermal energy to diblock copolymer films |
US8557128B2 (en) | 2007-03-22 | 2013-10-15 | Micron Technology, Inc. | Sub-10 nm line features via rapid graphoepitaxial self-assembly of amphiphilic monolayers |
US8097175B2 (en) | 2008-10-28 | 2012-01-17 | Micron Technology, Inc. | Method for selectively permeating a self-assembled block copolymer, method for forming metal oxide structures, method for forming a metal oxide pattern, and method for patterning a semiconductor structure |
US7959975B2 (en) | 2007-04-18 | 2011-06-14 | Micron Technology, Inc. | Methods of patterning a substrate |
US8294139B2 (en) | 2007-06-21 | 2012-10-23 | Micron Technology, Inc. | Multilayer antireflection coatings, structures and devices including the same and methods of making the same |
US8372295B2 (en) | 2007-04-20 | 2013-02-12 | Micron Technology, Inc. | Extensions of self-assembled structures to increased dimensions via a “bootstrap” self-templating method |
US8404124B2 (en) | 2007-06-12 | 2013-03-26 | Micron Technology, Inc. | Alternating self-assembling morphologies of diblock copolymers controlled by variations in surfaces |
US8080615B2 (en) | 2007-06-19 | 2011-12-20 | Micron Technology, Inc. | Crosslinkable graft polymer non-preferentially wetted by polystyrene and polyethylene oxide |
US7732533B2 (en) * | 2007-08-31 | 2010-06-08 | Micron Technology, Inc. | Zwitterionic block copolymers and methods |
US8999492B2 (en) | 2008-02-05 | 2015-04-07 | Micron Technology, Inc. | Method to produce nanometer-sized features with directed assembly of block copolymers |
US8101261B2 (en) | 2008-02-13 | 2012-01-24 | Micron Technology, Inc. | One-dimensional arrays of block copolymer cylinders and applications thereof |
US8426313B2 (en) | 2008-03-21 | 2013-04-23 | Micron Technology, Inc. | Thermal anneal of block copolymer films with top interface constrained to wet both blocks with equal preference |
US8425982B2 (en) | 2008-03-21 | 2013-04-23 | Micron Technology, Inc. | Methods of improving long range order in self-assembly of block copolymer films with ionic liquids |
US8114300B2 (en) * | 2008-04-21 | 2012-02-14 | Micron Technology, Inc. | Multi-layer method for formation of registered arrays of cylindrical pores in polymer films |
US8114301B2 (en) | 2008-05-02 | 2012-02-14 | Micron Technology, Inc. | Graphoepitaxial self-assembly of arrays of downward facing half-cylinders |
US8114468B2 (en) | 2008-06-18 | 2012-02-14 | Boise Technology, Inc. | Methods of forming a non-volatile resistive oxide memory array |
NL2005956A (en) * | 2010-02-26 | 2011-08-29 | Asml Netherlands Bv | Method and apparatus for treatment of self-assemblable polymer layers for use in lithography. |
US8304493B2 (en) | 2010-08-20 | 2012-11-06 | Micron Technology, Inc. | Methods of forming block copolymers |
US8956804B2 (en) * | 2011-06-23 | 2015-02-17 | Asml Netherlands B.V. | Self-assemblable polymer and methods for use in lithography |
WO2012175342A2 (en) | 2011-06-23 | 2012-12-27 | Asml Netherlands B.V. | Self-assemblable polymer and method for use in lithography |
US8900963B2 (en) | 2011-11-02 | 2014-12-02 | Micron Technology, Inc. | Methods of forming semiconductor device structures, and related structures |
US9087699B2 (en) | 2012-10-05 | 2015-07-21 | Micron Technology, Inc. | Methods of forming an array of openings in a substrate, and related methods of forming a semiconductor device structure |
US11214691B2 (en) | 2013-03-15 | 2022-01-04 | Aculon, Inc | Betaine polymer coatings prepared by living polymerization |
US9229328B2 (en) | 2013-05-02 | 2016-01-05 | Micron Technology, Inc. | Methods of forming semiconductor device structures, and related semiconductor device structures |
FR3010414B1 (en) * | 2013-09-09 | 2015-09-25 | Arkema France | PROCESS FOR OBTAINING NANO-STRUCTURED THICK FILMS OBTAINED FROM A BLOCK COPOLYMER COMPOSITION |
FR3010413B1 (en) * | 2013-09-09 | 2015-09-25 | Arkema France | METHOD FOR CONTROLLING THE PERIOD OF A NANO-STRUCTURE ASSEMBLY COMPRISING A MIXTURE OF BLOCK COPOLYMERS |
US9177795B2 (en) | 2013-09-27 | 2015-11-03 | Micron Technology, Inc. | Methods of forming nanostructures including metal oxides |
US10150088B2 (en) | 2013-11-08 | 2018-12-11 | Tufts University | Zwitterion-containing membranes |
Citations (1)
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US20040256662A1 (en) * | 2003-06-20 | 2004-12-23 | International Business Machines Corporation | Nonvolatile memory device using semiconductor nanocrystals and method of forming same |
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ES2208197T3 (en) * | 1999-09-07 | 2004-06-16 | Bayer Ag | FUNCTIONALIZED ALCOXAMINE INITIATORS. |
US6852816B2 (en) * | 2000-10-06 | 2005-02-08 | Biocompatibles Uk Limited | Zwitterionic polymers |
US6649138B2 (en) * | 2000-10-13 | 2003-11-18 | Quantum Dot Corporation | Surface-modified semiconductive and metallic nanoparticles having enhanced dispersibility in aqueous media |
US6746825B2 (en) * | 2001-10-05 | 2004-06-08 | Wisconsin Alumni Research Foundation | Guided self-assembly of block copolymer films on interferometrically nanopatterned substrates |
US20040142578A1 (en) * | 2002-03-28 | 2004-07-22 | Ulrich Wiesner | Thin film nanostructures |
US7196142B2 (en) * | 2002-04-04 | 2007-03-27 | The University Of Akron | Polyisobutylene-based block anionomers and cationomers and synthesis thereof |
EP1375457A1 (en) * | 2002-06-25 | 2004-01-02 | Bayer Aktiengesellschaft | One-pot process for the preparation of functionalized alkoxyamines |
US20040124092A1 (en) * | 2002-12-30 | 2004-07-01 | Black Charles T. | Inorganic nanoporous membranes and methods to form same |
JP5377857B2 (en) * | 2004-11-22 | 2013-12-25 | ウィスコンシン・アラムナイ・リサーチ・ファウンデーション | Method and composition for non-periodic pattern copolymer films |
US20060249784A1 (en) * | 2005-05-06 | 2006-11-09 | International Business Machines Corporation | Field effect transistor device including an array of channel elements and methods for forming |
US7347953B2 (en) * | 2006-02-02 | 2008-03-25 | International Business Machines Corporation | Methods for forming improved self-assembled patterns of block copolymers |
US20080038467A1 (en) * | 2006-08-11 | 2008-02-14 | Eastman Kodak Company | Nanostructured pattern method of manufacture |
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US7732533B2 (en) * | 2007-08-31 | 2010-06-08 | Micron Technology, Inc. | Zwitterionic block copolymers and methods |
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2007
- 2007-08-31 US US11/897,593 patent/US7732533B2/en active Active
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2008
- 2008-08-01 WO PCT/US2008/071916 patent/WO2009032448A2/en active Application Filing
- 2008-08-27 TW TW097132743A patent/TWI434868B/en active
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2010
- 2010-04-15 US US12/760,860 patent/US7910660B2/en active Active
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2011
- 2011-02-11 US US13/025,435 patent/US8022147B2/en active Active
- 2011-08-09 US US13/206,237 patent/US8236899B2/en active Active
Patent Citations (1)
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US20040256662A1 (en) * | 2003-06-20 | 2004-12-23 | International Business Machines Corporation | Nonvolatile memory device using semiconductor nanocrystals and method of forming same |
Non-Patent Citations (6)
Title |
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AYRES N ET AL: "Stimuli-responsive polyelectrolyte polymer brushes prepared via atom-transfer radical polymerization", LANGMUIR, vol. 23, no. 1, 2 January 2007 (2007-01-02), AMERICAN CHEMICAL SOCIETY, US, pages 182 - 189, XP002515705 * |
AYRES N ET AL: "Stimuli-responsive surfaces using polyampholyte polymer brushes prepared via atom transfer radical polymerization", LANGMUIR, vol. 23, no. 7, 27 March 2007 (2007-03-27), AMERICAN CHEMICAL SOCIETY US, pages 3744 - 3749, XP002515704 * |
KONG X ET AL: "Amphiphilic polymer brushes grown from the silicon surface by atom transfer radical polymerization", MACROMOLECULES, vol. 34, no. 6, 13 March 2001 (2001-03-13), AMERICAN CHEMICAL SOCIETY, US, pages 1837 - 1844, XP002528495 * |
LOWE A B ET AL: "SYNTHESIS AND CHARACTERIZATION OF ZWITTERIONIC BLOCK COPOLYMERS", MACROMOLECULES, vol. 31, no. 18, 8 September 1998 (1998-09-08), ACS, WASHINGTON, DC, US, pages 5991 - 5998, XP000776853, ISSN: 0024-9297 * |
SANG-MIN PARK ET AL: "Directed Assembly of Lamellae-Forming Block Copolymers by Using Chemically and Topographically Patterned Substrates", ADVANCED MATERIALS, vol. 19, no. 4, 26 January 2007 (2007-01-26), WILEY VCH, WEINHEIM, DE, pages 607 - 611, XP007905662, ISSN: 0935-9648, [retrieved on 20070126] * |
XIN X ET AL: "Synthesis of zwitterionic block copolymers via RAFT polymerization", EUROPEAN POLYMER JOURNAL, vol. 41, no. 7, 1 July 2005 (2005-07-01), PERGAMON PRESS LTD. OXFORD, GB, pages 1539 - 1545, XP004871131, ISSN: 0014-3057 * |
Also Published As
Publication number | Publication date |
---|---|
US20090062470A1 (en) | 2009-03-05 |
US20110144275A1 (en) | 2011-06-16 |
US8236899B2 (en) | 2012-08-07 |
US7910660B2 (en) | 2011-03-22 |
WO2009032448A2 (en) | 2009-03-12 |
US20110293833A1 (en) | 2011-12-01 |
TW200920753A (en) | 2009-05-16 |
US8022147B2 (en) | 2011-09-20 |
US20100204402A1 (en) | 2010-08-12 |
TWI434868B (en) | 2014-04-21 |
US7732533B2 (en) | 2010-06-08 |
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