Referenced by
Claims1. One or more monitor banks each comprising:
2. The one or more monitor banks of claim 1 wherein the first set of one time programmable memory circuits further comprises:
3. The one or more monitor banks of claim 2 wherein the first set of one time programmable memory circuits further comprises:
4. The one or more monitor banks of claim 2 wherein the first set of one time programmable memory circuits further comprises:
5. The one or more monitor banks of claim 2 wherein the first set of one time programmable memory circuits is a set of test eFuses, the second set of one time programmable memory circuits is a set of functional eFuses, the first particular one time programmable memory circuit is a first test eFuse circuit, the second particular one time programmable memory circuit is a second test eFuse circuit, and the third particular one time programmable memory circuit is a third eFuse circuit. 6. The one or more monitor banks of claim 5 wherein the set of test eFuses further comprises:
7. The one or more monitor banks of claim 6 wherein upon programming the first set of eFuse circuits results in a first group of zero or more unblown eFuse circuits and a second group of zero or more blown eFuse circuits. 8. The one or more monitor banks of claim 6 wherein at least one monitor bank is located in a kerf area of a semiconductor wafer. 9. The one or more monitor banks of claim 6 wherein at least one monitor bank is located on a packaged semiconductor chip and is blown prior to the time the packaged semiconductor chip is placed into commerce. 10. The one or more monitor banks of claim 6 wherein at least one monitor bank is located on a packaged semiconductor chip and is blown subsequent to a determination that the packaged semiconductor chip is defective. 11. The one or more monitor banks of claim 6 wherein the first eFuse circuit is configured such that the amount of current passing through a first eFuse link is expected to always cause the first eFuse link to blow, wherein the second eFuse circuit is configured such that the amount of current passing through a second eFuse link is expected to never cause the second eFuse link to blow, and wherein the plurality of sequentially varying eFuse circuits are configured such that the amount of current passing through each individual eFuse link contained in the plurality of eFuse circuits sequentially increases. 12. The one or more monitor banks of claim 11 wherein the current passing through each eFuse link is controlled by one or more transistors. 13. The one or more monitor banks of claim 12 wherein the increasing amount of current passing though each eFuse link is controlled by decreasing the channel lengths of the one or more transistors. 14. The one or more monitor banks of claim 12 wherein increasing amount of current passing though each eFuse link is controlled by increasing the gate widths of the one or more transistors. 15. A semiconductor chip comprising a bank of eFuse circuitry used to determine if functional eFuse programming will be or has been reliable, the bank of eFuse circuitry comprising:
16. The semiconductor chip of claim 15 further comprising:
17. The semiconductor chip of claim 15 further comprising:
18. The semiconductor chip of claim 17 wherein the first eFuse is configured so the amount of the current passing through a first eFuse link will always blow the first eFuse link, wherein the second eFuse is configured such that the amount of the current passing through a second eFuse link will never blow the second eFuse link, and wherein the plurality of sequentially varying eFuses are configured such that the amount of the current passing through each individual eFuse link sequentially increases. 19. The semiconductor chip of claim 18 wherein the current passing through each eFuse link is controlled by one or more transistors located in the eFuse blow circuitry, and where the increasing amount of current passing though each eFuse link is controlled by decreasing the channel length of the one or more transistors, or by increasing the gate width of the one or more transistors. 20. A method of determining whether functional eFuses contained on a semiconductor chip or a semiconductor wafer will be or have been programmed successfully, comprising the steps of:
21. The method of claim 20 further comprising the steps of:
22. A method of adjusting the functional eFuse circuit parameters to ensure the functional eFuse circuit will program successfully comprising the steps of:
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