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An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.

Inventors: Hrishikesh PATEL, Johannes Henricus Wilhelmus Jacobs, Gerardus Adrianus Antonius Maria Kusters, Thibault Simon Mathieu Laurent, Marcio Alexandre Cano Miranda, Ruud Hendricus Martinus Johannes Bloks, Peng Feng, Johan Gertrudis Cornelis Kunnen
Original Assignee: ASML NETHERLANDS B.V.
Current U.S. Classification: 355/30; 29/592

View patent at USPTO
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Claims

1. An immersion lithographic apparatus, comprising:

a substrate table including a recess having a support section configured to support a substrate;

a drain in the substrate table, the drain configured to receive an immersion fluid which leaks, in use, into a gap between an edge of a substrate on the substrate table and an edge of the recess; and

a thermal conditioning system configured to thermally condition the support section of the recess, the thermal conditioning system comprising an aperture configured to direct a jet of fluid onto a reverse side of the support section of the recess that is opposite to a support side that supports the substrate.

2. The immersion lithographic apparatus according to claim 1, wherein the substrate table includes a central section and a peripheral section that surrounds the central section, the recess formed in the central section and the drain formed in the peripheral section.

3. The immersion lithographic apparatus according to claim 2, wherein the central section and the peripheral section are separated from each other by an isolation system that is configured to reduce transfer of heat, or vibrations, or both, between the central section and the peripheral section.

4. The immersion lithographic apparatus according to claim 2, wherein the peripheral section of the substrate table comprises a heater arranged to heat directly the peripheral section of the substrate table.

5. The immersion lithographic apparatus according to claim 2, comprising a fluid extraction system configured to extract fluid that has been directed onto the reverse side of the support section of the recess.

6. The immersion lithographic apparatus according to claim 5, wherein the fluid extraction system is configured such that fluid extracted after it has been directed onto the reverse side of the support section of the recess passes through a conduit in the peripheral section of the substrate table, the conduit forming part of the thermal conditioning system and used to thermally condition the peripheral section.

7. The immersion lithographic apparatus according to claim 1, comprising a fluid extraction system configured to extract fluid from the drain and to extract fluid from the thermal conditioning system after it has been directed onto the reverse side of the support section of the recess.

8. The immersion lithographic apparatus according to claim 7, wherein the fluid extracted from the drain and fluid extracted after it has been directed onto the reverse side of the support section of the recess are extracted through a common conduit in the substrate table.

9. The immersion lithographic apparatus according to claim 7, wherein the fluid extraction system is configured such that fluid extracted from the drain is extracted through a first conduit in the substrate table and fluid extracted after it has been directed onto the reverse side of the support section of the recess is extracted through a second conduit in the peripheral section of the substrate table.

10. The immersion lithographic apparatus according to claim 1, wherein the thermal conditioning system comprises an aperture plate, in which the aperture is provided, the aperture plate provided adjacent the support section of the recess such that a jet of fluid provided by the aperture is directed onto the reverse side of the support section of the recess.

11. The immersion lithographic apparatus according to claim 10, wherein the support section of the recess is supported by a plurality of thin walls in turn supported by the aperture plate.

12. The immersion lithographic apparatus according to claim 11, wherein the plurality of thin walls include a hollow pillar and the aperture in the aperture plate is provided such that the jet of fluid is provided within the hollow pillar.

13. The immersion lithographic apparatus according to claim 11, further comprising an actuator system configured to move the substrate table, in use, in a scanning direction; and

wherein a plurality of the thin walls are planar and arranged such that a line within the plane of the walls is parallel to the scanning direction.

14. The immersion lithographic apparatus according to claim 10, wherein the aperture plate and the support section of the recess in part define a space which is sealed apart from the aperture and an outlet to extract the fluid after it has been directed onto the reverse side of the support section of the recess.

15. The immersion lithographic apparatus according to claim 10, wherein a porous material is provided on the aperture plate.

16. The immersion lithographic apparatus according to claim 10, wherein the reverse side of the support section of the recess includes an indent associated with the jet of fluid, the indent configured such that the fluid directed into the indent is directed back towards the aperture plate.

17. The immersion lithographic apparatus according to claim 10, wherein a cooler, or a heater, or both a cooler and heater, is provided in the fluid reservoir, or a fluid manifold configured to provide fluid to the aperture in the aperture plate, or both the fluid reservoir and manifold.

18. The immersion lithographic apparatus according to claim 10, wherein a cooler, or a heater, or both a cooler and heater, is provided upstream of the aperture and arranged to heat or cool the fluid before it exits the aperture.

19. A device manufacturing method comprising:

providing a substrate to a recess in a substrate table, the recess having a support section configured to support the substrate;

providing immersion fluid to an upper surface of the substrate;

extracting immersion fluid that leaks into a gap between an edge of the substrate and an edge of the recess through a drain in the substrate table; and

thermally conditioning the support section of the recess by directing a jet of fluid onto a reverse side of the support section of the recess that is opposite a support side that supports the substrate.

20. A lithographic apparatus, comprising:

a substrate table including a recess having a support section configured to support a substrate, and a peripheral section surrounding the recess; and

a thermal conditioning system configured to thermally condition the support section of the recess and the peripheral section of the substrate table, the thermal conditioning system comprising an aperture configured to direct a jet of fluid onto a reverse side of the support section of the recess that is opposite to a support side that supports the substrate, and an aperture configured to direct a jet of fluid onto a portion of the peripheral section of the substrate table.

21. A device manufacturing method comprising:

providing a substrate to a recess in a substrate table, the recess having a support section configured to support the substrate and the substrate table having a peripheral section surrounding the recess;

thermally conditioning the support section of the recess by directing a jet of fluid onto a reverse side of the support section of the recess that is opposite a support side that supports the substrate; and

thermally conditioning the peripheral section of the substrate table by directing a jet of fluid onto a portion of the peripheral section of the substrate table.

Drawings