A facility for selecting and refining electrical parameters for processing a microelectronic workpiece in a processing chamber is described. The facility initially configures the electrical parameters in accordance with either a numerical of the processing chamber or experimental data derived from operating...http://www.google.com/patents/US7020537?utm_source=gb-gplus-sharePatent US7020537 - Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece
