Method of making a field emitter device with submicron low work function emission tips without using photolithography. The method includes depositing in situ by evaporating or sputtering a discontinuous etch mask comprising randomly located discrete nuclei. In one embodiment an ion etch is applied to...http://www.google.com/patents/US5312514?utm_source=gb-gplus-sharePatent US5312514 - Method of making a field emitter device using randomly located nuclei as an etch mask
