The present invention relates to an apparatus for creating a pattern with extremely high resolution on a workpiece, such as a pattern on a semiconductor chip. The apparatus comprises a source for emitting electromagnetic radiation in the EUV wavelength range, a spatial modulator (SLM) having a multitude...http://www.google.com/patents/US6687041?utm_source=gb-gplus-sharePatent US6687041 - Pattern generator using EUV
