A lithography simulation method includes obtaining a mask transmission function from a mask layout, obtaining an optical image of the mask layout by using the mask transmission function, obtaining a function which is filtered by applying a predetermined function filter to the mask transmission function,...http://www.google.com/patents/US7784017?utm_source=gb-gplus-sharePatent US7784017 - Lithography simulation method, photomask manufacturing method, semiconductor device manufacturing method, and recording medium
