Multiple sequential processes are conducted in situ in a single-wafer processing chamber, particularly for forming ultrathin dielectric stacks of high quality. The chamber exhibits single-pass, laminar gas flow, facilitating safe and clean sequential processing. Furthermore, a remote plasma source widens...http://www.google.com/patents/US6544900?utm_source=gb-gplus-sharePatent US6544900 - In situ dielectric stacks
