An apparatus for cleaning a wafer includes a plurality of holders for contacting and securing peripheral portions of a wafer, and for rotating the wafer, a first plate disposed to face a first surface of the wafer, the first plate having a plurality of first nozzles for spraying a first cleaning solution...http://www.google.com/patents/US7264008?utm_source=gb-gplus-sharePatent US7264008 - Apparatus for cleaning a wafer
