In order to allow critical flaws in an inspected item to be determined early during a production process, the present invention includes the following steps: a step of detecting defects in a production process for the inspected item and storing defect positions; a step of collecting detailed defect information...http://www.google.com/patents/US7062081?utm_source=gb-gplus-sharePatent US7062081 - Method and system for analyzing circuit pattern defects
