A method for forming EUV LITHOGRAPHY GLASS STRUCTURES WITH VOIDS is disclosed which includes forming a slurry mixture including silica soot particles, and inserting the slurry mixture into a casting mold. The method provides low weight mass reduced rigid glass structures with beneficial thermal stability....http://www.google.com/patents/US6988377?utm_source=gb-gplus-sharePatent US6988377 - Method for making extreme ultraviolet lithography structures
