A high frequency power supplying device and a plasma generation device using the same includes: two or more inductive antennas; high frequency power sources, respectively supplying power to the antennas; and a vacuum chamber on which the antennas are provided so as to generate a plasma by inductive coupling...http://www.google.com/patents/US7567037?utm_source=gb-gplus-sharePatent US7567037 - High frequency power supply device and plasma generator
