The present invention is directed toward a method for reducing pattern distortions in imprinting layers by reducing gas pockets present in a layer of viscous liquid deposited on a substrate. To that end, the method includes varying a transport of the gases disposed proximate to the viscous liquid. Specifically,...http://www.google.com/patents/US8211214?utm_source=gb-gplus-sharePatent US8211214 - Single phase fluid imprint lithography method
