In a slit scan type projection exposure apparatus, a predetermined number of pulsed lights are emitted from a pulsed light source to transfer a pattern on a reticle to a wafer while the reticle and the wafer are scanned at a constant speed with respect to an exposure area on the wafer. At that time,...http://www.google.com/patents/US6496247?utm_source=gb-gplus-sharePatent US6496247 - Exposure apparatus and exposure method
