A process is provided for forming sharp asperities, useful as field emitters. The process comprises: patterning and doping a silicon substrate. The doped silicon substrate is anodized. The anodized area is then used for field emission tips. The process of the present invention is also useful for low...http://www.google.com/patents/US6187604?utm_source=gb-gplus-sharePatent US6187604 - Method of making field emitters using porous silicon
