An apparatus and method for the proximity photolithography of large substrates is provided. The apparatus includes a mask frame for holding the mask in a substantially vertical position. A tiltable platen is provided for receiving a photoresist-coated substrate in a horizontal position. The platen includes...http://www.google.com/patents/US6211945?utm_source=gb-gplus-sharePatent US6211945 - Apparatus and method for exposing substrates
