Methods of manufacturing power semiconductor devices include forming an epitaxial and dielectric layer, patterning and etching the dielectric layer, forming a first oxide layer, forming a first conductive layer on top of the first oxide layer, etching the first conductive layer away inside an active...http://www.google.com/patents/US8129245?utm_source=gb-gplus-sharePatent US8129245 - Methods of manufacturing power semiconductor devices with shield and gate contacts
