A method and apparatus for pre-heating a coil used to generate a plasma field in a processing chamber in a semiconductor fabrication system. The coil is pre-heated in the chamber prior to sputter depositing material onto a substrate and workpiece. The coil is pre-heated to a predetermined temperature,...http://www.google.com/patents/US6023038?utm_source=gb-gplus-sharePatent US6023038 - Resistive heating of powered coil to reduce transient heating/start up effects multiple loadlock system
