An atomic layer deposition (ALD) reactor (13) is disclosed that includes a substantially cylindrical chamber (15) and a wafer substrate (22) mounted within the chamber (15). The ALD reactor (13) further includes at least one injection tube (14) mounted within the chamber (15) having a plurality of apertures...http://www.google.com/patents/US6812157?utm_source=gb-gplus-sharePatent US6812157 - Apparatus for atomic layer chemical vapor deposition
