An exposure apparatus includes a projection optical system for projecting a pattern of a mask onto a substrate, a holder for holding the substrate and having a first channel for the fluid to flow, and a fluid supply unit for supplying the fluid from the first channel of the holder to at least part of...http://www.google.com/patents/US20050146695?utm_source=gb-gplus-sharePatent US20050146695 - Exposure apparatus and device manufacturing method
