A method for generating a write pattern to be used in a maskless-lithography process is described. During the method, a computer system determines a one-to-one correspondence between pixels in the write pattern and at least a subset of elements in a spatial-light modulator used in the maskless-lithography...http://www.google.com/patents/US20090073413?utm_source=gb-gplus-sharePatent US20090073413 - Write-Pattern Determination for Maskless Lithography
