A sputtering target comprising a main component having magnetic properties and consisting of a metal or an alloy, and a sub-component comprising at least one component selected from the group consisting of a non-magnetic metal and a semiconductor. The main component may be a metal selected from the group...http://www.google.com/patents/US6033537?utm_source=gb-gplus-sharePatent US6033537 - Sputtering target and method of manufacturing a semiconductor device
