A substrate washing and drying apparatus comprising a processing section for holding wafers, to which process solution to wash and vapor for drying the wafers are introduced, a supply/discharge port for introducing solution to the process section, and discharging the solution from the process...http://www.google.com/patents/US5845660?utm_source=gb-gplus-sharePatent US5845660 - Substrate washing and drying apparatus, substrate washing method, and substrate washing apparatus 
