A workpiece holding mechanism is used for holding a wafer. The wafer is sandwiched between a holding plate of the workpiece holding mechanism and a polishing pad attached to a polishing turn table. The workpiece is pressed against the polishing pad with a predetermined pressure so that the bottom surface...http://www.google.com/patents/US5913719?utm_source=gb-gplus-sharePatent US5913719 - Workpiece holding mechanism
