A spin-on glass (SOG) composition and a method of forming a silicon oxide layer utilizing the SOG composition are disclosed. The method includes coating on a semiconductor substrate having a surface discontinuity, an SOG composition containing perhydropolysilazane having a compound of the formula —(SiH2NH)n—...http://www.google.com/patents/US7179537?utm_source=gb-gplus-sharePatent US7179537 - Spin-on glass composition and method of forming silicon oxide layer in semiconductor manufacturing process using the same
