The invention includes methods of forming patterned reticles. Design features can be introduced into a layout for a reticle prior to optical proximity correction, and then removed prior to taping a pattern onto the reticle. Design features can alternatively, or additionally, be introduced after optical...http://www.google.com/patents/US6842889?utm_source=gb-gplus-sharePatent US6842889 - Methods of forming patterned reticles
