An atomic layer deposition (ALD) thin film deposition equipment having a cleaning apparatus, this equipment including a reactor 100 in which a wafer is mounted and a thin film is deposited on the wafer, a first reaction gas supply portion 210 for supplying a first reaction gas to the reactor 100, a second...http://www.google.com/patents/US20020007790?utm_source=gb-gplus-sharePatent US20020007790 - Atomic layer deposition (ALD) thin film deposition equipment having cleaning apparatus and cleaning method
