A method for processing a wafer in a spin, rinse, and dry (SRD) module is provided. The method includes engaging a wafer in a process plane, spinning the wafer in the process plane, and cleaning a top surface and a bottom surface of the wafer while spinning the wafer in the process plane. The process...http://www.google.com/patents/US7029539?utm_source=gb-gplus-sharePatent US7029539 - Angular spin, rinse, and dry module and methods for making and implementing the same
