Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which the photoresist coating is exposed to...http://www.google.com/patents/US20060193630?utm_source=gb-gplus-sharePatent US20060193630 - Monitoring apparatus and method particularly useful in photolithographically
