An undercoat-forming material comprising a novolak resin having a fluorene or tetrahydrospirobiindene structure, an organic solvent, an acid generator, and a crosslinker, optionally combined with an intermediate layer having an antireflective effect, has an absorptivity coefficient sufficient to provide...http://www.google.com/patents/US7303855?utm_source=gb-gplus-sharePatent US7303855 - Photoresist undercoat-forming material and patterning process
