An apparatus for depositing materials onto a micro-device workpiece includes a gas source system configured to provide a first precursor, a second precursor, and a purge gas. The apparatus can also include a valve assembly coupled to the gas source system. The valve assembly is configured to control...http://www.google.com/patents/US20050120954?utm_source=gb-gplus-sharePatent US20050120954 - Apparatus for controlling gas pulsing in processes for depositing materials onto micro-device workpieces
