Methods are provided for depositing a dielectric material. The dielectric material may be used for an anti-reflective coating or as a hardmask. In one aspect, a method is provided for processing a substrate including introducing a processing gas comprising a silane-based compound and an organosilicon...http://www.google.com/patents/US7105460?utm_source=gb-gplus-sharePatent US7105460 - Nitrogen-free dielectric anti-reflective coating and hardmask
