Apparatus and a method for cleaning, rinsing and drying substrates, such as semiconductor wafers. The apparatus has a cleaning tank in which one or more megasonic transducers are located, the transducers being adapted to direct megasonic energy past the substrates for cleaning the same. The substrates...http://www.google.com/patents/US4736760?utm_source=gb-gplus-sharePatent US4736760 - Apparatus for cleaning, rinsing and drying substrates
