A pedestal assembly and method for controlling temperature of a substrate during processing is provided. In one embodiment, the pedestal assembly includes an electrostatic chuck coupled to a metallic base. The electrostatic chuck includes at least one chucking electrode and metallic base includes at...http://www.google.com/patents/US20070139856?utm_source=gb-gplus-sharePatent US20070139856 - METHOD AND APPARATUS FOR CONTROLLING TEMPERATURE OF A SUBSTRATE
