A guideless stage for aligning a wafer in a microlithography system is disclosed, and a reaction frame is disclosed which isolates both external vibrations as well as vibrations caused by reaction forces from an object stage. In the guideless stage an object stage is disclosed for movement in at least...http://www.google.com/patents/US5528118?utm_source=gb-gplus-sharePatent US5528118 - Guideless stage with isolated reaction stage
