An integrated deposition system is provided which is capable of vaporizing low vapor pressure liquid precursors and delivering this vapor into a processing region for use in the fabrication of advanced integrated circuits. The integrated deposition system is made up of a heated exhaust system, a remote...http://www.google.com/patents/US20010035127?utm_source=gb-gplus-sharePatent US20010035127 - DEPOSITION REACTOR HAVING VAPORIZING, MIXING AND CLEANING CAPABILITIES
