The invention concerns a system for treating gases such as PFC or HFC with plasma, comprising: (6) pumping means (6) thereof the outlet is at a pressure substantially equal to atmospheric pressure, means (8), at the pump output, to produce a plasmas at atmospheric pressure. ...http://www.google.com/patents/US20040195088?utm_source=gb-gplus-sharePatent US20040195088 - Application of dense plasmas generated at atmospheric pressure for treating gas effluents
