A method of forming a component capable of being exposed to a plasma in a process chamber comprises forming a structure comprising a surface and electroplating yttrium, and optionally aluminum or zirconium, onto the surface. Thereafter, the electroplated layer can be annealed to oxide the yttrium and...http://www.google.com/patents/US20080017516?utm_source=gb-gplus-sharePatent US20080017516 - FORMING A CHAMBER COMPONENT HAVING A YTTRIUM-CONTAINING COATING
