A combination nozzle for applying a developer material and a washing solution material at different time intervals to a photoresist material layer disposed on a wafer is provided. The combination nozzle includes a number of developer nozzle tips connected to a developer supply line and a number of washing...http://www.google.com/patents/US6322009?utm_source=gb-gplus-sharePatent US6322009 - Common nozzle for resist development
