This invention has enabled a new, simple nanoporous dielectric fabrication method. In general, this invention uses a polyol, such as glycerol, as a solvent. This new method allows both bulk and thin film aerogels to be made without supercritical drying, freeze drying, or a surface modification...http://www.google.com/patents/US5807607?utm_source=gb-gplus-sharePatent US5807607 - Polyol-based method for forming thin film aerogels on semiconductor substrates 
