A semiconductor wafer cleaning apparatus comprises an outer tank, a cleaning tank provided within the outer tank, a wafer carrier provided within the cleaning tank, a plurality of jet nozzles directed toward the wafer carrier, a main pipe connected to the jet nozzles, a circulating pump connected to...http://www.google.com/patents/US6532976?utm_source=gb-gplus-sharePatent US6532976 - Semiconductor wafer cleaning apparatus
