A plasma processing apparatus for performing a plasma process on a target substrate includes a process container configured to accommodate the target substrate and to reduce pressure therein. A first electrode is disposed within the process container. A supply system is configured to supply a process...http://www.google.com/patents/US20050276928?utm_source=gb-gplus-sharePatent US20050276928 - Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method
